• 2559 引用
  • 25 h指数
1989 …2020

年単位の研究成果

Pureに変更を加えた場合、すぐここに表示されます。

研究成果

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Article
2 引用 (Scopus)

Applications of Microstructures Fabricated by PBW to Electric-Micro Filters (Invited)

Nishikawa, H., Seki, Y., Furuta, Y., Uchiya, N., Nakata, T., Watanabe, T., Nakao, R., S.Uchida, S. U., Haga, J., Satoh, T., Ohkubo, T., Ishii, Y. & Kamiya, T., 2008 7 24, : : Book of Abstracts, 11th International Conference on Nuclear Microprobe Technology and Applications (20-25 July, 2008, Debrecen, Hungary). p. 61

研究成果: Article

15 引用 (Scopus)

Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

Miyake, Y., Nishikawa, H., Watanabe, E. & Ito, D., 1997 12 11, : : Journal of Non-Crystalline Solids. 222, p. 266-271 6 p.

研究成果: Article

14 引用 (Scopus)

Characteristic red photoluminescence band in oxygen-deficient silica glass

Sakurai, Y., Nagasawa, K., Nishikawa, H. & Ohki, Y., 1999 7, : : Journal of Applied Physics. 86, 1, p. 370-373 4 p.

研究成果: Article

37 引用 (Scopus)

Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica

Nishikawa, H., Nakamura, R., Ohki, Y., Nagasawa, K. & Hama, Y., 1992 10 1, : : The American Physical Society. 46, p. 8073-8079

研究成果: Article

13 引用 (Scopus)

Characterization of ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica glass

Nishikawa, H., Nakamura, R., Ohki, Y., Nagasawa, K. & Hama, Y., 1992 1 1, : : Physical Review B. 46, 13, p. 8073-8079 7 p.

研究成果: Article

13 引用 (Scopus)

Characterization of ion-implanted silica glass by vacuum  ultraviolet absorption spectroscopy

Hattori, M., Nishihara, Y., Ohki, Y., Fujimaki, M., Souno, T., Nishikawa, H., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2001 9 3, : : Radiation Effects in Insulators, Paper No. P-H.3 (Lisbon, Portugal).

研究成果: Article

Characterization of ion-implanted silica glass by vacuum ultraviolet absorption spectroscopy

Hattori, M., Nishihara, Y., Ohki, Y., Fujimaki, M., Souno, T., Nishikawa, H., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2002 5, : : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 362-365 4 p.

研究成果: Article

10 引用 (Scopus)

Control of refractive index of fluorinated polyimide by proton beam irradiation

Arai, Y., Ohki, Y., Saito, K. & Nishikawa, H., 2013 1 1, : : Japanese Journal of Applied Physics. 52, 1, 012601.

研究成果: Article

2 引用 (Scopus)
6 引用 (Scopus)
54 引用 (Scopus)

Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

Takano, K., Kamiya, T., Sugimoto, M., Seki, S., Satoh, T., Ishii, Y., Ohkubo, T., Koka, M. & Nishikawa, H., 2010 6 24, : : 27th International Conference of Photopolymer Science and Technology (ICPST-27).

研究成果: Article

149 引用 (Scopus)

Defects and optical absorption bands induced by surplus oxygen in high-purity synthetic silica

Nishikawa, H., Tohmon, R., Ohki, Y., Nagasawa, K. & Hama, Y., 1989 12 1, : : Journal of Applied Physics. 65, 12, p. 4672-4678 7 p.

研究成果: Article

126 引用 (Scopus)

Defects in thermal oxide studied by photoluminescence spectroscopy

Nishikawa, H., Stathis, J. H. & Cartier, E., 1999 8 30, : : Applied Physics Letters. 75, 9, p. 1219-1221 3 p.

研究成果: Article

4 引用 (Scopus)

Development of embedded Mach-Zehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing

Kada, W., Miura, K., Kato, H., Saruya, R., Kubota, A., Satoh, T., Koka, M., Ishii, Y., Kamiya, T., Nishikawa, H. & Hanaizumi, O., 2015, : : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 348, p. 218-222 5 p.

研究成果: Article

6 引用 (Scopus)

Development of micromachining technology in ion microbeam system at TIARA, JAEA

Kamiya, T., Nishikawa, H., Satoh, T., Haga, J., Oikawa, M., Ishii, Y., Ohkubo, T., Uchiya, N. & Furuta, Y., 2009 3 1, : : Applied Radiation and Isotopes. 67, 3, p. 488-491 4 p.

研究成果: Article

4 引用 (Scopus)

Effect of high-temperature treatment on optical-absorption bands in amorphous SiO2

Dohguchi, N., Munekuni, S., Nishikawa, H., Ohki, Y. & Nagasawa, K., 1991 9 1, : : Journal of Applied Physics. 70, p. 2788-2790

研究成果: Article

3 引用 (Scopus)

Effect of high-temperature treatment on optical-absorption bands in amorphous SiO2

Dohguchi, N., Munekuni, S., Nishikawa, H., Ohki, Y. & Nagasawa, K., 1991 12 1, : : Journal of Applied Physics. 70, 5, p. 2788-2790 3 p.

研究成果: Article

3 引用 (Scopus)

Effect of implanted ion species on the decay kinetics of 2.7 eV photoluminescence in thermal SiO2 films

Seol, K. S., Ohki, Y., Nishikawa, H., Takiyama, M. & Hama, Y., 1996 12 1, : : Journal of Applied Physics. 80, 11, p. 6444-6447 4 p.

研究成果: Article

48 引用 (Scopus)

Effect of implanted ion species on the decay of 2.7 eV photoluminescence in thermal

Seol, K. S., Ohki, Y., Nishikawa, H., Takiyama, M. & Hama, Y., 1996 12 1, : : Journal of Applied Physics. 80, p. 6444-6447

研究成果: Article

Effects of Ion Microbeam Irradiation on Silica Glass

Nishikawa, H., Fukagawa, K., Yanagi, T., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2004 3 1, : : Transactions of the Materials Research Society of Japan. 29, p. 603-606

研究成果: Article

Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Tanabe, Y., Nishikawa, H., Seki, Y., Satoh, T., Ishii, Y., Kamiya, T., Watanabe, T. & Sekiguchi, A., 2011 8 1, : : Microelectronic Engineering. 88, 8, p. 2145-2148 4 p.

研究成果: Article

12 引用 (Scopus)

Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing

Seki, Y., Furuta, Y., Nishikawa, H., Watanabe, T., Nakata, T., Satoh, T., Ishii, Y. & Kamiya, T., 2009 4 1, : : Microelectronic Engineering. 86, 4-6, p. 945-948 4 p.

研究成果: Article

8 引用 (Scopus)

Energy states of Ge-doped SiO2 glass estimated through absorption and photoluminescence

Fujimaki, M., Ohki, Y. & Nishikawa, H., 1997 2 1, : : Journal of Applied Physics. 81, 3, p. 1042-1046 5 p.

研究成果: Article

42 引用 (Scopus)
42 引用 (Scopus)
24 引用 (Scopus)
1 引用 (Scopus)
24 引用 (Scopus)

Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy

Yamaguchi, T., Watanabe, E., Souno, T., Nishikawa, H., Hattori, M., Ohki, Y., Kamiya, T. & Arakawa, K., 2001 9 3, : : Abstracts of Radiation Effects in Insulators.

研究成果: Article

Evaluation of silica glasses implanted by high-energy ions using a UV-excited microspectroscopy

Yamaguchi, T., Watanabe, E., Souno, T., Nishikawa, H., Hattori, M., Ohki, Y., Kamiya, T. & Arakawa, K., 2002 5, : : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 371-374 4 p.

研究成果: Article

Evaluation of Three Dimensional Microstructures on Silica Glass Fabricated by Ion Microbeam

Nishikawa, H., Souno, T., Hattori, M., Nishihara, Y., Ohki, Y., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T., Arakawa, K. & Fujimaki, M., 2001 10 1, : : JAERI-Review 2001, TIARA Annual Report 2000. p. 235-237

研究成果: Article

Fabrication and evaluation of 3D-electric micro filters using proton beam writing

Furuta, Y., Nishikawa, H., Satoh, T., Ishii, Y., Kamiya, T., Nakao, R. & Uchida, S., 2009 4 1, : : Microelectronic Engineering. 86, 4-6, p. 1396-1400 5 p.

研究成果: Article

11 引用 (Scopus)

Fabrication and Evaluation of Micrometer-scale Optical Elements using Three-dimensional Irradiation Effects Localized in Micro and Nano-scale Regions

Nishikawa, H., Fukagawa, K., Yanagi, T., Nakamura, T., Ohki, Y., Watanabe, E., Oikawa, M., Arakawa, K. & Kamiya, T., 2004 10 4, : : TIARA Annual Report 2003, JAERI-Review 2004-025. p. 234-236

研究成果: Article

Fabrication of BIT thick films patterned by proton beam writing

Yamaguchi, M., Watanabe, K., Nishikawa, H. & Masuda, Y., 2017 7 1, : : Journal of the Korean Physical Society. 71, 2, p. 88-91 4 p.

研究成果: Article

1 引用 (Scopus)