西川 宏之

研究成果

年別の研究成果 1989 1994 1995 1996 1997 2007 2009 2010 2011 2012 2022

• 139 Article
• 17 Conference contribution
• 9 Conference article
• 8 Paper
• 1 その他
  • 1 Review article

年別の研究成果

年別の研究成果

検索結果

• 2009

  Micro-pattering of siloxane films by proton beam writing

  Nishikawa, H., Tsuchiya, R., Yasukawa, T., Kaneko, T., Furuta, Y. & Ohishi, T., 2009, In: Journal of Photopolymer Science and Technology. 22, 2, p. 239-243 5 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Siloxane 64%
  • Proton 40%
  • Liquid Film 29%
  • Chemical Transformation 9%
  6 被引用数 (Scopus)

• Micro-patterning of Siloxane Films by Proton Beam Writing

  Nishikawa, H., Tsuchiya, R., Yasukawa, T., Kaneko, T., Furuta, Y. & Ohishi, T., 2009 6月 1, In: Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009). 22, p. 239-243

  研究成果: Article › 査読

• Proton Beam Writing and Its Applications (Invited Talk)

  Nishikawa, H., 2009 12月 8, In: Innovative Materials Technologies Utilizing Ion Beam, 19th Academic Symposium of MRS-Japan 2009, Dec. 8 (2009).

  研究成果: Article › 査読
• 2008

  Applications of Microstructures Fabricated by PBW to Electric-Micro Filters　(Invited)

  Nishikawa, H., Seki, Y., Furuta, Y., Uchiya, N., Nakata, T., Watanabe, T., Nakao, R., S.Uchida, S. U., Haga, J., Satoh, T., Ohkubo, T., Ishii, Y. & Kamiya, T., 2008 7月 24, In: Book of Abstracts, 11th International Conference on Nuclear Microprobe Technology and Applications (20-25 July, 2008, Debrecen, Hungary). p. 61

  研究成果: Article › 査読

• Fabrication and evaluation of 3D-DEP devices utilized by proton beam writing

  Furuta, Y., Nishikawa, H., Satoh, T., Ishii, Y., Kamiya, T., Nakao, R. & Uchida, S., 2008 9月 1, In: 34th International Conference on Micro and Nano Engineering (15 -18 September 2008 Athens - Greece).

  研究成果: Article › 査読

• Ni electroplating on a resist micro-machined by proton beam writing

  Uchiya, N., Furuta, Y., Nishikawa, H., Watanabe, T., Haga, J., Satoh, T., Oikawa, M., Ishii, Y. & Kamiya, T., 2008 10月, In: Microsystem Technologies. 14, 9-11, p. 1537-1540 4 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • Electroplating 75%
  • electroplating 74%
  • proton beams 62%
  • Electrodeposition 51%
  18 被引用数 (Scopus)

• Proton Beam Writer for manufacturing　in Shibaura Institute of Technology

  Yoshida, E., Nishikawa, H., Furuta, Y., Seki, Y. & Tsuchiya, R., 2008 7月 24, In: Book of Abstracts, 11th International Conference on Nuclear Microprobe Technology and Applications, 20-25 July, 2008, Debrecen, Hungary. p. 118

  研究成果: Article › 査読
• 2007

  Correlation between the luminescence properties and the surface structures of submicron silica particles

  Inai, S., Harao, A. & Nishikawa, H., 2007 4月 1, In: Journal of Non-Crystalline Solids. 353, 5-7, p. 510-513 4 p.

  研究成果: Article › 査読

  • Photoluminescence 100%
  • Luminescence 90%
  • Surface structure 74%
  • Silica 63%
  • Annealing 61%
  8 被引用数 (Scopus)

• Fabrication of 3-D Structures of Resist byProton Beam Writing

  Furuta, Y., Uchiya, N., Nishikawa, H., Haga, J., Satoh, T., Oikawa, M., Ishii, Y. & Kamiya, T., 2007 5月 29, In: The 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (USA, May 29-June 1, 2007).

  研究成果: Article › 査読

• Fabrication of High-Aspect-Ratio Microstructures by Proton Beam Writing (PBW)

  Uchiya, N., Furuta, Y., Nishikawa, H., Watanabe, T., Haga, J., Sato, T., Ishii, Y. & Kamiya, T., 2007 6月 7, In: 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology, Abstracts (France, June 7-9, 2007). p. 201-202

  研究成果: Article › 査読

• Fabrication of three-dimensional structures of resist by proton beam writing

  Furuta, Y., Uchiya, N., Nishikawa, H., Haga, J., Sato, T., Oikawa, M., Ishii, Y. & Kamiya, T., 2007, In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25, 6, p. 2171-2174 4 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • proton beams 62%
  • Fabrication 45%
  • fabrication 37%
  • Kapton (trademark) 16%
  21 被引用数 (Scopus)

• Micro-machining of resists on silicon by proton beam writing

  Uchiya, N., Harada, T., Murai, M., Nishikawa, H., Haga, J., Sato, T., Ishii, Y. & Kamiya, T., 2007 7月, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 260, 1, p. 405-408 4 p.

  研究成果: Article › 査読

  • Proton beams 100%
  • machining 64%
  • proton beams 62%
  • Machining 48%
  • Silicon 48%
  44 被引用数 (Scopus)

• Micro-photoluminescence study on defects induced by ion microbeam in silica glass

  Murai, M., Nishikawa, H., Nakamura, T., Aiba, H., Ohki, Y., Oikawa, M., Sato, T. & Kamiya, T., 2007 4月 1, In: Journal of Non-Crystalline Solids. 353, 5-7, p. 537-541 5 p.

  研究成果: Article › 査読

  • Photoluminescence 100%
  • Fused silica 86%
  • microbeams 77%
  • silica glass 70%
  • Stopping Power 63%
  2 被引用数 (Scopus)

• Modification of structural and optical properties of silica glass induced by ion microbeam

  Nishikawa, H., Murai, M., Nakamura, T., Ohki, Y., Oikawa, M., Sato, T., Sakai, T., Ishii, Y. & Fukuda, M., 2007 8月 5, In: Surface and Coatings Technology. 201, 19-20 SPEC. ISS., p. 8185-8189 5 p.

  研究成果: Article › 査読

  • Fused silica 100%
  • microbeams 89%
  • Optical properties 89%
  • silica glass 81%
  • Structural properties 77%
  3 被引用数 (Scopus)

• Study on the electron beam irradiation effects on silica glass by cathodoluminescence,

  Hirokawa, S., Harada, T. & Nishikawa, H., 2007 6月 18, In: Book of Abstracts, 10th Spacecraft Charging Technology Conference, France, June 18-21, 2007. p. 48

  研究成果: Article › 査読
• 2006

  Electron-beam irradiation effects on silica glass studied by cathodoluminescence

  Harada, T. & Nishikawa, H., 2006 6月 25, In: Book of Abstracts, pp. 118-119, 6th Symposium, SiO2 Advanced Dielectrics and Related Devices (Palermo, Italy), 25-28 June 2006.. p. 118-119

  研究成果: Article › 査読

  1 被引用数 (Scopus)

• Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam

  Nishikawa, H., Fukagawa, K., Nakamura, T., Ohki, Y., Oikawa, M., Kamiya, T. & Arakawa, K., 2006 1月, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 242, 1-2, p. 437-440 4 p.

  研究成果: Article › 査読

  • Fused silica 100%
  • microbeams 89%
  • silica glass 81%
  • Spatial distribution 79%
  • oxygen ions 78%
  9 被引用数 (Scopus)
• 2005

  Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan

  Hattori, T., Irisawa, E. & Nishikawa, H., 2005 6月 8, In: Proceedings of 2005 International Symposium on Electrical Insulating Materials,. p. 636-639

  研究成果: Article › 査読

• Evaluation of Irradiation Effects on Silica Glass by Electron Beam

  Harada, T. & Nishikawa, H., 2005 4月 4, In: Book of Abstracts, 9th Spacecraft Charging Technology Conference. p. 107

  研究成果: Article › 査読
• 2004

  Effects of Ion Microbeam Irradiation on Silica Glass

  Nishikawa, H., Fukagawa, K., Yanagi, T., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2004 3月 1, In: Transactions of the Materials Research Society of Japan. 29, p. 603-606

  研究成果: Article › 査読

• Fabrication and Evaluation of Micrometer-scale Optical Elements using Three-dimensional Irradiation Effects Localized in Micro and Nano-scale Regions

  Nishikawa, H., Fukagawa, K., Yanagi, T., Nakamura, T., Ohki, Y., Watanabe, E., Oikawa, M., Arakawa, K. & Kamiya, T., 2004 10月 4, In: TIARA Annual Report 2003, JAERI-Review 2004-025. p. 234-236

  研究成果: Article › 査読

• Proton Microbeam Irradiation Effects on Silica Glass

  Nishikawa, H., Fukagawa, K., Yanagi, T., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2004 7月 21, In: Abstract Book of 1st International Workshop on Proton Beam Writing. p. 26

  研究成果: Article › 査読

• Spatial distribution of irradiation effects on silica glass induced by ion microbeam

  Nishikawa, H., Fukagawa, K., Yanagi, T., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2004 9月 5, In: Default journal. p. 87

  研究成果: Article › 査読
• 2002

  Characterization of ion-implanted silica glass by vacuum ultraviolet absorption spectroscopy

  Hattori, M., Nishihara, Y., Ohki, Y., Fujimaki, M., Souno, T., Nishikawa, H., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2002 5月, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 362-365 4 p.

  研究成果: Article › 査読

  • Ultraviolet spectroscopy 100%
  • Absorption spectroscopy 86%
  • Fused silica 79%
  • ultraviolet absorption 72%
  • ultraviolet spectroscopy 69%
  10 被引用数 (Scopus)

• Evaluation of silica glasses implanted by high-energy ions using a UV-excited microspectroscopy

  Yamaguchi, T., Watanabe, E., Souno, T., Nishikawa, H., Hattori, M., Ohki, Y., Kamiya, T. & Arakawa, K., 2002 5月, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 371-374 4 p.

  研究成果: Article › 査読

  • Photoluminescence 100%
  • Fused silica 86%
  • silica glass 70%
  • Ions 56%
  • photoluminescence 43%

• Radiation effects and surface deformation of silica by ion microbeam

  Nishikawa, H., Souno, T., Hattori, M., Nishihara, Y., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2002 5月, In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 191, 1-4, p. 342-345 4 p.

  研究成果: Article › 査読

  • Radiation effects 100%
  • Atomic force microscopy 96%
  • microbeams 94%
  • radiation effects 84%
  • Silica 78%
  3 被引用数 (Scopus)
• 2001

  Characterization of ion-implanted silica glass by vacuum 　ultraviolet absorption spectroscopy

  Hattori, M., Nishihara, Y., Ohki, Y., Fujimaki, M., Souno, T., Nishikawa, H., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T. & Arakawa, K., 2001 9月 3, In: Radiation Effects in Insulators, Paper No. P-H.3 (Lisbon, Portugal).

  研究成果: Article › 査読

• Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy

  Yamaguchi, T., Watanabe, E., Souno, T., Nishikawa, H., Hattori, M., Ohki, Y., Kamiya, T. & Arakawa, K., 2001 9月 3, In: Abstracts of Radiation Effects in Insulators.

  研究成果: Article › 査読

• Evaluation of Three Dimensional Microstructures on Silica Glass Fabricated by Ion Microbeam

  Nishikawa, H., Souno, T., Hattori, M., Nishihara, Y., Ohki, Y., Yamaguchi, T., Watanabe, E., Oikawa, M., Kamiya, T., Arakawa, K. & Fujimaki, M., 2001 10月 1, In: JAERI-Review 2001, TIARA Annual Report 2000. p. 235-237

  研究成果: Article › 査読

• Structures and properties of amorphous silicon dioxide -issues on the reliability and novel applications

  Nishikawa, H., 2001 3月 1, In: Silicon-Based Materials and Devices” edited by H. S. Nalwa. 2, p. 99-123

  研究成果: Article › 査読
• 1999

  Characteristic red photoluminescence band in oxygen-deficient silica glass

  Sakurai, Y., Nagasawa, K., Nishikawa, H. & Ohki, Y., 1999 7月, In: Journal of Applied Physics. 86, 1, p. 370-373 4 p.

  研究成果: Article › 査読

  • silica glass 100%
  • photoluminescence 61%
  • oxygen 52%
  • dosage 28%
  • irradiation 28%
  40 被引用数 (Scopus)

• Defects in thermal oxide studied by photoluminescence spectroscopy

  Nishikawa, H., Stathis, J. H. & Cartier, E., 1999 8月 30, In: Applied Physics Letters. 75, 9, p. 1219-1221 3 p.

  研究成果: Article › 査読

  • photoluminescence 100%
  • oxides 88%
  • defects 79%
  • spectroscopy 74%
  • hydrogen 25%
  5 被引用数 (Scopus)

• Oxygen-deficient centers and excess si in buried oxide using photoluminescence spectroscopy

  Nishikawa, H., 1999 1月 1, In: Physical Review B - Condensed Matter and Materials Physics. 60, 23, p. 15910-15918 9 p.

  研究成果: Article › 査読

  • Photoluminescence spectroscopy 100%
  • Photoluminescence Spectroscopy 51%
  • Photoluminescence 51%
  • Oxides 40%
  • Oxygen 38%
  44 被引用数 (Scopus)

• Temperature dependence of the lifetime of 4.3-eV photoluminescence in oxygen-deficient amorphous SiO2

  Seol, K. S., Fujimaki, M., Ohki, Y. & Nishikawa, H., 1999 1月 1, In: Physical Review B. 59, p. 1590-1593

  研究成果: Article › 査読

  21 被引用数 (Scopus)
• 1998

  Structure and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings

  Fujimaki, M., Watanabe, T., Katoh, T., Karasawa, T., Miyazaki, N., Ohki, Y. & Nishikawa, H., 1998 2月 1, In: Physical Review B. 57, p. 3920-3926

  研究成果: Article › 査読

  96 被引用数 (Scopus)

• Structures and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped optical-fiber gratings

  Fujimaki, M., Watanabe, T., Katoh, T., Kasahara, T., Miyazaki, N., Ohki, Y. & Nishikawa, H., 1998, In: Physical Review B - Condensed Matter and Materials Physics. 57, 7, p. 3920-3926 7 p.

  研究成果: Article › 査読

  • Absorption spectra 100%
  • Paramagnetic Center 92%
  • Luminescence 86%
  • Photons 80%
  • Excimer 74%
  96 被引用数 (Scopus)
• 1997

  Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

  Miyake, Y., Nishikawa, H., Watanabe, E. & Ito, D., 1997 12月 11, In: Journal of Non-Crystalline Solids. 222, p. 266-271 6 p.

  研究成果: Article › 査読

  • Excimer lasers 100%
  • Fused silica 90%
  • Optical properties 80%
  • silica glass 73%
  • Excimer 70%
  14 被引用数 (Scopus)

• Energy states of Ge-doped SiO₂ glass estimated through absorption and photoluminescence

  Fujimaki, M., Ohki, Y. & Nishikawa, H., 1997 2月 1, In: Journal of Applied Physics. 81, 3, p. 1042-1046 5 p.

  研究成果: Article › 査読

  • photoluminescence 100%
  • glass 82%
  • life (durability) 48%
  • ultraviolet absorption 45%
  • vacuum 44%
  45 被引用数 (Scopus)

• Energy states of Ge-doped SiO2 glass estimated through absorption and photoluminescence

  Fujimaki, M., Ohki, Y. & Nishikawa, H., 1997 2月 1, In: Journal of Applied Physics. 81, p. 1042-1046

  研究成果: Article › 査読

  45 被引用数 (Scopus)

• Evaluation of microscopic structural randomness in SiO₂ by analysis of photoluminescence decay profiles

  Ishii, K., Seol, K. S., Ohki, Y. & Nishikawa, H., 1997, In: Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi). 119, 3, p. 1-6 6 p.

  研究成果: Article › 査読

  • Photoluminescence 100%
  • Exponential functions 75%
  • Ions 56%
  • Infrared absorption 49%
  • Oxygen vacancies 47%

• Formation mechanisms of paramagnetic defect centers induced by excimer lasers, gamma rays, and mechanical fracturing in amorphous SiO₂

  Nishikawa, H., Watanabe, E., Ito, D. & Ohki, Y., 1997 1月 1, In: Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi). 121, 3, p. 9-19 11 p.

  研究成果: Article › 査読

  • Excimer lasers 100%
  • Gamma rays 80%
  • Defects 44%
  • Lasers 12%
  2 被引用数 (Scopus)

• Luminescence properties of sol-gel synthesized silica glass induced by an ArF excimer

  Mukasa, K., Ono, M., Wakabayashi, R., Ishii, K., Ohki, Y. & Nishikawa, H., 1997 1月 1, In: Journal of Physics D: Applied Physics. 30, p. 283-285

  研究成果: Article › 査読

  4 被引用数 (Scopus)

• Luminescence properties of sol-gel synthesized silica glass induced by an ArF excimer laser

  Mukasa, K., Ono, M., Wakabayashi, R., Ishii, K., Ohki, Y. & Nishikawa, H., 1997 1月 21, In: Journal of Physics D: Applied Physics. 30, 2, p. 283-285 3 p.

  研究成果: Article › 査読

  • Excimer lasers 100%
  • Luminescence 95%
  • Fused silica 90%
  • Sol-gels 84%
  • silica glass 73%
  4 被引用数 (Scopus)

• Photoluminescence of oxygen-deficient-type defects in a-SiO2

  Nishikawa, H., Miyake, Y., Watanabe, E., Ito, D., Seol, K. S., Ohki, Y., Ishii, K., Sakurai, Y. & Nagasawa, K., 1997 1月 1, In: Journal of Non-Crystalline Solids. 222, p. 221-227

  研究成果: Article › 査読

  35 被引用数 (Scopus)

• Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

  Tochikubo, F., Watanabe, T., Nishikawa, H., Watanabe, E., Ito, D., Okumura, T. & Kaibe, H., 1997 1月 1, In: Memoirs of Faculty of Engineering. p. 21-30

  研究成果: Article › 査読

• Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO₂ films

  Seol, K. S., Karasawa, T., Ohki, Y., Nishikawa, H. & Takiyama, M., 1997 6月, In: Microelectronic Engineering. 36, 1-4, p. 193-195 3 p.

  研究成果: Article › 査読

  • Ion implantation 100%
  • Photoluminescence 95%
  • Ion Implantation 90%
  • Annealing 73%
  • ion implantation 67%
  6 被引用数 (Scopus)

• Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO2 films

  Seol, K. S., Karasawa, T., Ohki, Y., Nishikawa, H. & Takiyama, M., 1997 1月 1, In: Microelectrons Engineering. 36, p. 193-195

  研究成果: Article › 査読

  6 被引用数 (Scopus)
• 1996

  Effect of implanted ion species on the decay kinetics of 2.7 eV photoluminescence in thermal SiO₂ films

  Seol, K. S., Ohki, Y., Nishikawa, H., Takiyama, M. & Hama, Y., 1996 12月 1, In: Journal of Applied Physics. 80, 11, p. 6444-6447 4 p.

  研究成果: Article › 査読

  • photoluminescence 100%
  • kinetics 85%
  • decay 80%
  • ions 66%
  • silica glass 54%
  49 被引用数 (Scopus)

• Effect of implanted ion species on the decay of 2.7 eV photoluminescence in thermal

  Seol, K. S., Ohki, Y., Nishikawa, H., Takiyama, M. & Hama, Y., 1996 12月 1, In: Journal of Applied Physics. 80, p. 6444-6447

  研究成果: Article › 査読

• Laser-power dependence of absorption changes in Ge-doped glass induced by a KrF excimer laser

  Fujimaki, M., Yagi, K., Ohki, Y. & Nishikawa, H., 1996 1月 1, In: Physical Review B - Condensed Matter and Materials Physics. 53, 15, p. 9859-9862 4 p.

  研究成果: Article › 査読

  • Excimer lasers 100%
  • Excimer 70%
  • excimer lasers 64%
  • Glass 51%
  • Lasers 48%
  29 被引用数 (Scopus)