弓野 健太郎

研究成果

年別の研究成果 1970 1996 2002 2003 2004 2005 2022

• 157 Article
• 7 Conference article
• 5 Conference contribution
• 2 Paper
• 2 その他
  • 1 Comment/debate
  • 1 Review article

年別の研究成果

年別の研究成果

検索結果

• Article

  Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

  Zhao, Y., Toyama, M., Kita, K., Kyuno, K. & Toriumi, A., 2006, In: Applied Physics Letters. 88, 7, 072904.

  研究成果: Article › 査読

  • lanthanum oxides 100%
  • moisture 72%
  • deterioration 70%
  • oxide films 60%
  • surface roughness 56%
  189 被引用数 (Scopus)

• Molecular static simulation of the effect of alkaline metal impurities on the bonding of Al atoms at the grain boundaries of aluminum

  G.Tu, G. T., A.Itoh, A. I., K.Kyuno, K. K., R.Yamamoto, R. Y. & Kyuno, K., 1997 4月 1, In: Materials Research Society Symposium Proceedings. 458

  研究成果: Article › 査読

• Morphology of Ge thin films crystallized by Au-induced layer exchange at low temperature (220 °c)

  Sunthornpan, N., Kimura, K. & Kyuno, K., 2022 5月 1, In: Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 40, 3, 030601.

  研究成果: Article › 査読

  • Thin films 100%
  • Amorphous Material 73%
  • Crystallization 57%
  • Crystalline materials 55%
  • thin films 54%

• New method for Characterizing Dielectric Properties of High-k Films Using Time-Dependent Open-Circuit Potential Measurement

  Kita, K., Sasagawa, M., Kyuno, K. & Toriumi, A., 2002 9月 1, In: Default journal. p. 66-67

  研究成果: Article › 査読

• New method for characterizing dielectric properties of high-k films with time-dependent open-circuit potential measurement

  Kita, K., Sasagawa, M., Kyuno, K. & Toriumi, A., 2003 6月 15, In: Japanese Journal of Applied Physics, Part 2: Letters. 42, 6 B, p. L631-L633

  研究成果: Article › 査読

  • Dielectric properties 100%
  • dielectric properties 68%
  • Networks (circuits) 45%
  • Etching 44%
  • Atoms 42%

• Non-nearest-neighbor jumps in 2D diffusion: Pd on W(110)

  Oh, S. M., Koh, S. J., Kyuno, K. & Ehrlich, G., 2002 6月 10, In: Physical Review Letters. 88, 23, p. 2361021-2361024 4 p.

  研究成果: Article › 査読

  • atoms 100%
  • activation 78%
  34 被引用数 (Scopus)

• Non-Nearest-Neighbor Jumps in 2D Diffusion: Pd on W(110)

  Oh, S. M., Koh, S. J., Kyuno, K. & Ehrlich, G., 2002 1月 1, In: Physical Review Letters. 88, 23, 1 p.

  研究成果: Article › 査読

  • atoms 100%
  • activation 78%
  5 被引用数 (Scopus)

• Non-nearest-neighbor jumps in 2D diffusion : Pd on W(110)

  S.M.Oh, S. M. O., S.J.Koh, S. J. K., K.Kyuno, K. K., G.Ehrlich, G. E. & Kyuno, K., 2002 4月 1, In: Physical Review Letters. 88

  研究成果: Article › 査読

  34 被引用数 (Scopus)

• Novel crystallization process for germanium thin films: Surfactant-crystallization method

  Miura, H., Kamiko, M. & Kyuno, K., 2013 1月, In: Japanese Journal of Applied Physics. 52, 1, 010204.

  研究成果: Article › 査読

  • Germanium 100%
  • Surface active agents 81%
  • Crystallization 81%
  • surfactants 71%
  • Thin films 70%
  3 被引用数 (Scopus)

• Observation of the creation and annihilation of local current paths in HfO2 thin films on pt by ultrahigh-vacuum conductive atomic force microscopy: Evidence of oxygen spill over during the forming process

  Sasaki, N., Kita, K., Toriumi, A. & Kyuno, K., 2009 6月, In: Japanese Journal of Applied Physics. 48, 6, 060202.

  研究成果: Article › 査読

  • Ultrahigh vacuum 100%
  • Atomic force microscopy 81%
  • Hazardous materials spills 80%
  • oxygen ions 69%
  • ultrahigh vacuum 63%
  9 被引用数 (Scopus)

• Observation of the creation and annihilation of local current paths in HfO2 thin films on Pt by ultrahigh-vacuum conductive atomic force microscopy : Evidence of oxygen spill over during the forming process

  N.Sasaki, N. S., K.Kita, K. K., A.Toriumi, A. T., K.Kyuno, K. K. & Kyuno, K., 2009 6月 1, In: Japanese Journal of Applied Physics. 48

  研究成果: Article › 査読

  9 被引用数 (Scopus)

• Origin of Permittivity Enhancement of HfSiO and HfON Film with High Temperature Annealing

  Kyuno, K., 2005 3月 1, In: International Conference on Microelectronics and Interfaces(ICMI '06).

  研究成果: Article › 査読

• Oxidation-Induced Damages on Germanium MIS Capacitors with HfO2 Gate Dielectrics

  Kita, K., Sasagawa, M., Tomida, K., Kyuno, K. & Toriumi, A., 2003 9月 1, In: Extended Abstracts of 2003 International Conference on Solid State Devices and Materials (SSDM). p. 292-293

  研究成果: Article › 査読

• Peformance and Time-dependent Degradation in a Single Grain-size Pentacene TFTs

  Komoda, T., Kita, K., K.Kyuno, K. K., Torium, A. & Kyuno, K., 2002 9月 1, In: Extended Abstracts of 2002 International Conference on Solid State Devices and Materials (SSDM). p. 202-203

  研究成果: Article › 査読

• Performance and Degradation in Single Grain-Size Pentacene Thin Film Transistors

  T.Komoda, T. K., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2003 4月 1, In: Japanese Journal of Applied Physics 1. 42

  研究成果: Article › 査読

  32 被引用数 (Scopus)

• Performance and degradation in single grain-size pentacene thin-film transistors

  Komoda, T., Kita, K., Kyuno, K. & Toriumi, A., 2003 6月, In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 42, 6 A, p. 3662-3665 4 p.

  研究成果: Article › 査読

  • Thin film transistors 100%
  • Thin films 73%
  • Moisture 67%
  • moisture 62%
  • transistors 62%
  32 被引用数 (Scopus)

• Permittivity Increase of Yttriium-Doped HfO2 through Structural Phase Transformation

  K.Kita, K. K., K.Kyuno, K. K., A.Torium, A. T. & Kyuno, K., 2005 4月 1, In: Applied Physics Letters. 86

  研究成果: Article › 査読

• Permittivity Increase of Yttrium-Doped HfO2 through Structural Phase Transformation

  Kita, K., Kyuno, K. & Toriumi, A., 2004 12月 1, In: 35th IEEE Semiconductor Interface Specialists Conference (SISC).

  研究成果: Article › 査読

• Permittivity increase of yttrium-doped Hf O2 through structural phase transformation

  Kita, K., Kyuno, K. & Toriumi, A., 2005 3月 7, In: Applied Physics Letters. 86, 10, p. 1-3 3 p., 102906.

  研究成果: Article › 査読

  • yttrium 100%
  • phase transformations 82%
  • permittivity 64%
  • hafnium 19%
  • shrinkage 15%
  169 被引用数 (Scopus)

• Perpendicular magnetic anisotropy and magnetooptical properties of (Co_1-xNi_x)/Pd multilayers

  Ha, J. G., Kyuno, K. & Yamamoto, R., 1997, In: IEEE Transactions on Magnetics. 33, 2 PART 1, p. 1049-1051 3 p.

  研究成果: Article › 査読

  • Magnetic anisotropy 100%
  • Curie temperature 97%
  • Magnetic Anisotropy 80%
  • Anisotropy 64%
  • Multilayers 60%
  2 被引用数 (Scopus)

• Perpendicular magnetic anisotropy and magneto-optical properties of Co/(Pd-Au) metallic multilayers

  M.Kamiko, M. K., J.-G.Ha, J-G. H., K.Kyuno, K. K., R.Yamamoto, R. Y. & Kyuno, K., 1996 4月 1, In: Journal of the Magnetics Society of Japan. 20

  研究成果: Article › 査読

• Perpendicular magnetic anisotropy of Au/(Fe-Co) metallic multilayers

  K.Kyuno, K. K., J.-G.Ha, J-G. H., M.Iwanami, M. I., K.Mae, K. M., M.Kamiko, M. K., S.Asano, S. A., R.Yamamoto, R. Y. & Kyuno, K., 1995 4月 1, In: Proceedings of the Third IUMRS International Conference in Asia.

  研究成果: Article › 査読

• Perpendicular magnetic anisotropy of Co/Pd1-xAux multilayer

  J.-G.Ha, J-G. H., K.Kyuno, K. K., R.Yamamoto, R. Y. & Kyuno, K., 1995 4月 1, In: Proceedings of the Third IUMRS International Conference in Asia.

  研究成果: Article › 査読

• Perpendicular magnetic anisotropy of metallic multilayers composed of magnetic layers only: Ni/Co and Ni/Fe multilayers

  Kyuno, K., Ha, J. G., Yamamoto, R. & Asano, S., 1996 5月, In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 35, 5 SUPPL. A, p. 2774-2778 5 p.

  研究成果: Article › 査読

  • Magnetic anisotropy 100%
  • Anisotropy 64%
  • Fermi level 64%
  • Multilayers 60%
  • anisotropy 39%
  14 被引用数 (Scopus)

• Perpendicular magnetic anisotropy of metallic multilayers composed of magnetic layers only: Ni/Co and Ni/Fe multilayers

  K.Kyuno, K. K., J.-G.Ha, J-G. H., R.Yamamoto, R. Y., S.Asano, S. A. & Kyuno, K., 1996 4月 1, In: Japanese Journal of Applied Physics. 35

  研究成果: Article › 査読

  14 被引用数 (Scopus)

• Post-Deposition Annealing Effects on Interface States Generation in HfO2/SiO2/Si MOS Capacitors

  Sasagawa, M., Kita, K., Kyuno, K. & Toriumi, A., 2004 9月 1, In: Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM). p. 534-535

  研究成果: Article › 査読

• Re-Examination on the Universality of Si-MOS Inversion Layer Mobility

  Irie, H., Kita, K., Kyuno, K., Takagi, S., Takasaki, K., Kubota, M., Saito, S., Nishikawa, S. & Toriumi, A., 2003 9月 1, In: Extended Abstracts of 2003 International Conference on Solid State Devices and Materials (SSDM). p. 716-717

  研究成果: Article › 査読

• Retarded Growth of Sputtered HfO2 Films on Germanium

  Kita, K., Sasagawa, M., Toyama, M., Kyuno, K. & Toriumi, A., 2004 4月 1, In: 2004 MRS Spring Meeting.

  研究成果: Article › 査読

• Reversible creation and annihilation of a local leakage path in HfO ₂/GeO_x stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy

  Yamamura, K., Kita, K., Toriumi, A. & Kyuno, K., 2006 12月 7, In: Applied Physics Letters. 89, 22, 222101.

  研究成果: Article › 査読

  • ultrahigh vacuum 100%
  • leakage 82%
  • atomic force microscopy 76%
  • conduction 66%
  • degradation 25%
  5 被引用数 (Scopus)

• Reversible creation and annihilation of a local leakage path in HfO2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy

  K.Yamamura, K. Y., K.Kita, K. K., A.Toriumi, A. T., K.Kyuno, K. K. & Kyuno, K., 2006 11月 1, In: Applied Physics Letters 89.

  研究成果: Article › 査読

• RHEED intensity oscillation during the epitaxial growth of silver and gold films

  K.Mae, K. M., K.Kyuno, K. K., T.Kaneko, T. K., R.Yamamoto, R. Y. & Kyuno, K., 1991 4月 1, In: Materials Research Society Symposium Proceedings.

  研究成果: Article › 査読

• RHEED investigation of metal epitaxies and multilayers

  Mae, K., Kyuno, K., Kaneko, T. & Yamamoto, R., 1994 8月, In: Microelectronic Engineering. 25, 2-4, p. 235-239 5 p.

  研究成果: Article › 査読

  • Reflection high energy electron diffraction 100%
  • Multilayers 46%
  • Multilayer 43%
  • Surface Reconstruction 33%
  • Magnetic Anisotropy 31%

• Semiconducting Properties of Pentacene Thin Films Studied by Complex Impedance Analysis and Photo-induced Effects

  Toriumi, A., Yokoyama, T., Nishimura, T., Yamada, T., Kita, K. & Kyuno, K., 2004 10月 1, In: 206th Meeting of The Electrochemical Society.

  研究成果: Article › 査読

• Si(001) surface morphology during SiGe alloy growth

  R.M.Tromp, R. M. T., D.G.Cahill, D. G. C., K.Kyuno, K. K. & Kyuno, K., 1999 4月 1, In: Materials Research Society.

  研究成果: Article › 査読

• Stable Observation of the Evolution of Leakage Spots in HfO2/SiO2 stacked structures

  Kyuno, K., Kita, K. & Toriumi, A., 2004 9月 1, In: Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM). p. 788-789

  研究成果: Article › 査読

• Step-edge barriers: Truths and kinetic consequences

  Kyuno, K. & Ehrlich, G., 1997, In: Surface Science. 383, 2-3, p. L766-L774

  研究成果: Article › 査読

  • Atoms 100%
  • Crystal Growth 94%
  • Crystal growth 67%
  • kinetics 57%
  • atoms 39%
  31 被引用数 (Scopus)

• Step-edge barriers: Truths and kinetic consequences

  Kyuno, K. & Ehrlich, G., 1997 12月 19, In: Surface Science. 394, 1-3, p. L179-L187

  研究成果: Article › 査読

  • Atoms 100%
  • Crystal Growth 94%
  • Crystal growth 67%
  • kinetics 57%
  • atoms 39%
  36 被引用数 (Scopus)

• Step-edge barriers : Truth and kinetic consequences

  K.Kyuno, K. K., G.Ehrlich, G. E. & Kyuno, K., 1997 4月 1, In: Surface Science. 383

  研究成果: Article › 査読

• Step-edge barriers on pt(111): An atomistic view

  Kyuno, K. & Ehrlich, G., 1998 1月 1, In: Physical Review Letters. 81, 25, p. 5592-5595 4 p.

  研究成果: Article › 査読

  • escape 100%
  • platinum 99%
  • ion microscopes 71%
  • deduction 64%
  • adatoms 52%
  51 被引用数 (Scopus)

• Step-edge barriers on Pt(111) : An atomistic view

  Kyuno, K. & Ehrlich, G., 1998 12月 21, In: Physical Review Letters. 85, p. 5592

  研究成果: Article › 査読

  51 被引用数 (Scopus)

• Step-edge versus interior barriers to atom incorporation at lattice steps

  Oh, S. M., Kyuno, K., Wang, S. C. & Ehrlich, G., 2003 2月 26, In: Physical Review B - Condensed Matter and Materials Physics. 67, 7

  研究成果 › 査読

  • Atoms 100%
  • Energy barriers 98%
  • Energy Barrier 92%
  • Molecular Cluster 62%
  • Adatoms 61%
  8 被引用数 (Scopus)

• Structural and electrical properties of HfLaO_x films for an amorphous high-k gate insulator

  Yamamoto, Y., Kita, K., Kyuno, K. & Toriumi, A., 2006, In: Applied Physics Letters. 89, 3, 032903.

  研究成果: Article › 査読

  • insulators 100%
  • electrical properties 99%
  • amorphous materials 79%
  • electric potential 73%
  • metal oxide semiconductors 69%
  146 被引用数 (Scopus)

• Structural and magnetic properties of Ag/Cr metallic superlattices

  Kyuno, K., Hara, S., Kaneko, T. & Yamamoto, R., 1992, In: Journal of Physics: Condensed Matter. 4, 22, p. 5125-5136 12 p., 011.

  研究成果: Article › 査読

  • Metallic superlattices 100%
  • Monolayers 51%
  • Magnetic properties 48%
  • Structural properties 42%
  • Superlattice 40%
  8 被引用数 (Scopus)

• Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator

  Y.Yamamoto, Y. Y., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2006 4月 1, In: Applied Physics Letters. 89

  研究成果: Article › 査読

• Structures of silver/chromium metallic superlattice

  T.Kaneko, T. K., K.Kyuno, K. K., O.Niikura, O. N., S.Hara, S. H., R.Yamamoto, R. Y. & Kyuno, K., 1990 4月 1, In: Materials Research Society Symposium Proceedings. 187

  研究成果: Article › 査読

• Study of La-induced flat band voltage shift in Metal/HfLaOx/SiO2/Si capacitors

  Y.Yamamoto, Y. Y., K.Kita, K. K., K.Kyuno, K. K., A.Toriumi, A. T. & Kyuno, K., 2007 11月 1, In: Japanese Journal of Applied Physics Letters 46.

  研究成果: Article › 査読

• Study of La-induced flat band voltage shift in metal/HfLaO _x/SiO₂/Si capacitors

  Yamamoto, Y., Kita, K., Kyuno, K. & Toriumi, A., 2007 11月 6, In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 46, 11, p. 7251-7255 5 p.

  研究成果: Article › 査読

  • capacitors 100%
  • Capacitors 90%
  • Metals 73%
  • shift 69%
  • electric potential 62%
  117 被引用数 (Scopus)

• Study of the epitaxial growth of metal on metal using RHEED

  Mae, K., Kyuno, K., Kaneko, T. & Yamamoto, R., 1993 9月, In: Journal of Magnetism and Magnetic Materials. 126, 1-3, p. 121-124 4 p.

  研究成果: Article › 査読

  • Reflection high energy electron diffraction 100%
  • Epitaxial growth 68%
  • Epitaxial Growth 58%
  • Surface Reconstruction 33%
  • Magnetic Anisotropy 31%

• Study on the epitaxial growth of metal on metal using RHEED

  Kyuno, K., 1993 1月 1, In: Journal of Magnetism and Magnetic Materials. 126

  研究成果: Article › 査読

• Study on the growth mechanism of pentacene thin films by the analysis of island density and island size distribution

  Tejima, M., Kita, K., Kyuno, K. & Toriumi, A., 2004 10月 25, In: Applied Physics Letters. 85, 17, p. 3746-3748 3 p.

  研究成果: Article › 査読

  • thin films 100%
  • nucleation 72%
  • plots 39%
  • temperature 28%
  33 被引用数 (Scopus)