0.1-μm double-deck-shaped gate HJFET with reduced gate-fringing-capacitance for ultra-high-speed ICs

Sh Wada, J. Yamazaki, M. Ishikawa, Tadashi Maeda

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

This paper describes on a novel double-deck-shaped (DDS) gate technology for 0.1-μm heterojunction-FETs (HJFETs) that have half the external gate fringing capacitance (Cfext) of conventional T-shaped gate HJFETs. By introducing a T-shaped SiO2-opening technique based on two-step dry-etching with W-film masks, we have fabricated 0.1-μm DDS gate-openings adapted to the reduction in Cfext and to the voidless-filling of gate-metals. Moreover, by using WSi-collimated sputtering and electroless Au-plating, 0.1-μm DDS WSi/Ti/Pt/Au gate HJFETs with high uniformity and reproducibility are made. Fabricated n-Al0.2Ga0.8As/In0.15Ga0.75As HJFETs exhibit an excellent Vth standard-deviation (σVth) of 39 mV. Also, the HJFET covered with a SiO2 film shows a very high millimeter-wave performance with fT of 120 GHz and fmax of 165 GHz, due to the low Cfext. In addition, a high fT of 151 GHz and fmax of 186 GHz are obtained without a SiO2 film.

本文言語English
ホスト出版物のタイトルTechnical Digest - GaAs IC Symposium (Gallium Arsenide Integrated Circuit)
出版社IEEE
出版ステータスPublished - 1997
外部発表はい
イベントProceedings of the 1997 19th Annual IEEE Gallium Arsenide Integrated Circuit Symposium - Anaheim, CA, USA
継続期間: 1997 10 121997 10 15

Other

OtherProceedings of the 1997 19th Annual IEEE Gallium Arsenide Integrated Circuit Symposium
CityAnaheim, CA, USA
Period97/10/1297/10/15

ASJC Scopus subject areas

  • 電子工学および電気工学

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