0.2-μm Fully-Self-Aligned Y-Shaped Gate HJFET's with Reduced Gate-Fringing Capacitance Fabricated Using Collimated Sputtering and Electroless Au-Plating

Shigeki Wada, Masatoshi Tokushima, Muneo Fukaishi, Noriaki Matsuno, Hitoshi Yano, Hikaru Hida, Tadashi Maeda

研究成果: Article査読

9 被引用数 (Scopus)

フィンガープリント

「0.2-μm Fully-Self-Aligned Y-Shaped Gate HJFET's with Reduced Gate-Fringing Capacitance Fabricated Using Collimated Sputtering and Electroless Au-Plating」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Chemical Compounds