A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

研究成果: Article › 査読

本文言語	English
ページ（範囲）	71-75
ジャーナル	Proceedings of 10th VLSI Multilevel Interconnection Conference
出版ステータス	Published - 1993 6月 8

引用スタイル

@article{32e42b3300d240fda8a9788bea74b22c,

title = "A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD",

author = "T.Homma T.Homma and Y.Murao Y.Murao and Tetsuya Homma",

year = "1993",

month = jun,

day = "8",

language = "English",

pages = "71--75",

journal = "Proceedings of 10th VLSI Multilevel Interconnection Conference",

}