A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.

Naoki Ono, Kazuhiro Harada, Jun Furukawa, Kazuya Suzuki, Michio Kida, Yasushi Shimanuki

研究成果: Article

元の言語English
ページ(範囲)503-514
ジャーナルElectrochemical Society "Semiconductor Silicon 1998" meeting proceeding
1998-1
出版物ステータスPublished - 1998 5 1

これを引用

@article{554653e2521d4a5cbfb1978a68d29c9e,
title = "A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.",
author = "Naoki Ono and Kazuhiro Harada and Jun Furukawa and Kazuya Suzuki and Michio Kida and Yasushi Shimanuki",
year = "1998",
month = "5",
day = "1",
language = "English",
volume = "1998-1",
pages = "503--514",
journal = "Electrochemical Society {"}Semiconductor Silicon 1998{"} meeting proceeding",

}

TY - JOUR

T1 - A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.

AU - Ono, Naoki

AU - Harada, Kazuhiro

AU - Furukawa, Jun

AU - Suzuki, Kazuya

AU - Kida, Michio

AU - Shimanuki, Yasushi

PY - 1998/5/1

Y1 - 1998/5/1

M3 - Article

VL - 1998-1

SP - 503

EP - 514

JO - Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding

JF - Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding

ER -