A Room Temperature CVD Technology for Interlayer in Deep submicron Multilevel Interconnection

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

研究成果: Article › 査読

本文言語	English
ページ（範囲）	289-292
ジャーナル	Proceedings of IEEE International Electron Devices Meeting
出版ステータス	Published - 1991 12月 8

引用スタイル

@article{20b447d2f4a84c9bb15313a82a9959a4,

title = "A Room Temperature CVD Technology for Interlayer in Deep submicron Multilevel Interconnection",

author = "T.Homma T.Homma and Y.Murao Y.Murao and Tetsuya Homma",

year = "1991",

month = dec,

day = "8",

language = "English",

pages = "289--292",

journal = "Proceedings of IEEE International Electron Devices Meeting",

}