Absorption changes induced by UV-photon irradiation in Ge-doped SiO2 thin films fabricated by plasma CVD method from tetraethoxysilane

T. Yanagi, Y. Ohki, H. Nishikawa

研究成果: Paper査読

フィンガープリント

「Absorption changes induced by UV-photon irradiation in Ge-doped SiO<sub>2</sub> thin films fabricated by plasma CVD method from tetraethoxysilane」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds