An algorithm to visualize tool difference transitions in semiconductor fabrications

Tomoaki Kubo, Masateru Minami, Tetsuya Homma

研究成果: Conference contribution

抄録

To solve tool difference problems in semiconductor fabrication, it is necessary to identify problematic tool from numbers of process tools and process steps, and discover the cause of its performance difference. In this paper we propose a method to assist engineers in finding cause of tool difference. This method visualizes tool difference transition by post-processing results of periodically executed regression analysis. Effectiveness of this method is shown by Monte Carlo simulation based on a conceptual model of a fabrication line.

本文言語English
ホスト出版物のタイトル2008 International Symposium on Semiconductor Manufacturing, ISSM 2008
ページ215-218
ページ数4
出版ステータスPublished - 2008
イベント2008 17th International Symposium on Semiconductor Manufacturing, ISSM 2008 - Tokyo, Japan
継続期間: 2008 10 272008 10 29

出版物シリーズ

名前IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
ISSN(印刷版)1523-553X

Conference

Conference2008 17th International Symposium on Semiconductor Manufacturing, ISSM 2008
国/地域Japan
CityTokyo
Period08/10/2708/10/29

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 工学(全般)
  • 産業および生産工学
  • 電子工学および電気工学

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