An Outlier Removal Method for SPC in Semiconductor Manufacturing

研究成果: Article

元の言語English
ページ(範囲)292-298
ジャーナルThe Society of Instrument and Control Engineers (SICE) Journal of Control, Measurement, and System Integration
3
出版物ステータスPublished - 2010 7 31

これを引用

@article{8a4a802ea0c049fa8fbdd3dd6e82f122,
title = "An Outlier Removal Method for SPC in Semiconductor Manufacturing",
author = "T. Kubo and Homma, {T. Kubo;M.Minami;T.}",
year = "2010",
month = "7",
day = "31",
language = "English",
volume = "3",
pages = "292--298",
journal = "The Society of Instrument and Control Engineers (SICE) Journal of Control, Measurement, and System Integration",

}

TY - JOUR

T1 - An Outlier Removal Method for SPC in Semiconductor Manufacturing

AU - Kubo, T.

AU - Homma, T. Kubo;M.Minami;T.

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Y1 - 2010/7/31

M3 - Article

VL - 3

SP - 292

EP - 298

JO - The Society of Instrument and Control Engineers (SICE) Journal of Control, Measurement, and System Integration

JF - The Society of Instrument and Control Engineers (SICE) Journal of Control, Measurement, and System Integration

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