Application of bessel beams for microfabrication of dielectrics by femtosecond laser

Andrius Marcinkevicius, Saulius Juodkazis, Shigeki Matsuo, Vygantas Mizeikis, Hiroaki Misawa

研究成果: Article

64 引用 (Scopus)

抄録

We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 102-103 in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.

元の言語English
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
40
発行部数11 A
出版物ステータスPublished - 2001 11 1
外部発表Yes

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Gaussian beams
Microfabrication
Ultrashort pulses
Fused silica
lasers
Aspect ratio
Laser pulses
recording
aspect ratio
silicon dioxide
propagation
pulses

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

これを引用

Application of bessel beams for microfabrication of dielectrics by femtosecond laser. / Marcinkevicius, Andrius; Juodkazis, Saulius; Matsuo, Shigeki; Mizeikis, Vygantas; Misawa, Hiroaki.

:: Japanese Journal of Applied Physics, Part 2: Letters, 巻 40, 番号 11 A, 01.11.2001.

研究成果: Article

Marcinkevicius, Andrius ; Juodkazis, Saulius ; Matsuo, Shigeki ; Mizeikis, Vygantas ; Misawa, Hiroaki. / Application of bessel beams for microfabrication of dielectrics by femtosecond laser. :: Japanese Journal of Applied Physics, Part 2: Letters. 2001 ; 巻 40, 番号 11 A.
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AU - Misawa, Hiroaki

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