抄録
Electron beam-induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.
本文言語 | English |
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ページ(範囲) | 76-79 |
ページ数 | 4 |
ジャーナル | Journal of Microscopy |
巻 | 214 |
号 | 1 |
DOI | |
出版ステータス | Published - 2004 4月 1 |
外部発表 | はい |
ASJC Scopus subject areas
- 病理学および法医学
- 組織学