Application of transmission electron microscopes to nanometre-sized fabrication by means of electron beam-induced deposition

Masayuki Shimojo, K. Mitsuishi, M. Tanaka, M. Han, K. Furuya

研究成果: Article

22 引用 (Scopus)

抜粋

Electron beam-induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.

元の言語English
ページ(範囲)76-79
ページ数4
ジャーナルJournal of Microscopy
214
発行部数1
DOI
出版物ステータスPublished - 2004 4
外部発表Yes

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ASJC Scopus subject areas

  • Instrumentation

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