Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

Yasuhiro Miyake, Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito

研究成果査読

14 被引用数 (Scopus)

抄録

Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.

本文言語English
ページ(範囲)266-271
ページ数6
ジャーナルJournal of Non-Crystalline Solids
222
DOI
出版ステータスPublished - 1997 12 11
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • 凝縮系物理学
  • 材料化学

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