TY - JOUR
T1 - Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser
AU - Miyake, Yasuhiro
AU - Nishikawa, Hiroyuki
AU - Watanabe, Eiki
AU - Ito, Daisuke
N1 - Funding Information:
This work is partly supportedb y Grants-in-Aid from the Tokyo MetropolitanU niversitya nd the Japanese Ministry of Education, Science, and Culture (No. 07805033).
PY - 1997/12/11
Y1 - 1997/12/11
N2 - Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.
AB - Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.
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U2 - 10.1016/S0022-3093(97)90123-X
DO - 10.1016/S0022-3093(97)90123-X
M3 - Article
AN - SCOPUS:0031550016
SN - 0022-3093
VL - 222
SP - 266
EP - 271
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
ER -