Characteristics of a GaN metal semiconductor field-effect transistor grown on a sapphire substrate by metalorganic chemical vapor deposition

Takashi Egawa, Kouichi Nakamura, Hiroyasu Ishikawa, Takashi Jimbo, Masayoshi Umeno

研究成果: Article査読

13 被引用数 (Scopus)

抄録

Electron mobilities of an n-GaN layer on a sapphire substrate grown by metalorganic chemical vapor deposition were 585 and 1217 cm2/V·s with electron carrier concentrations of 1.1 × 1017 and 2.4 × 1016 cm-3 at 300 and 77 K, respectively. A high current level of 281 mA/mm and a large transconductance (gm) of 33 mS/mm have been achieved for a GaN metal semiconductor field-effect transistor (MESFET) with a gate length of 2 μm and a width of 200 μm at 25°C. The GaN MESFET at high temperature showed degraded characteristics: low gm, gate leakage and poor pinch-off. However, the GaN MESFET at 25°C, measured again after measurement at 400°C, showed the initial characteristic in spite of gate leakage. The GaN MESFET exhibited the sidegating effect, which was thought to be caused by the deep level in the undoped GaN layer beneath the channel layer. The uniformity of the sheet resistance seems to be insensitive to the high dislocation density in the GaN layer.

本文言語English
ページ(範囲)2630-2633
ページ数4
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
38
4 B
DOI
出版ステータスPublished - 1999
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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