Characterization of ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica glass

Hiroyuki Nishikawa, Ryuta Nakamura, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama

研究成果: Article

13 引用 (Scopus)

抄録

An electron-spin-resonance (ESR) study was made on the defect centers induced by vacuum-ultraviolet (vuv) laser (7.9-eV) irradiation in high-purity silica glasses. We observed two types of ESR spectra, each consisting of a concentric pair of four-line peaks, in low-OH oxygen-surplus silica produced with plasma methods. Spin-Hamiltonian parameters determined by computer simulation of the experimental ESR line shapes are consistent with oxy-radicals of chlorine. The observed ClOx (x=2,3) radicals are considered to be due to the reaction between chlorine and oxygen, which were both produced by vuv-laser irradiation.

元の言語English
ページ(範囲)8073-8079
ページ数7
ジャーナルPhysical Review B
46
発行部数13
DOI
出版物ステータスPublished - 1992
外部発表Yes

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silica glass
Fused silica
Paramagnetic resonance
Ultraviolet lasers
electron paramagnetic resonance
purity
Chlorine
Vacuum
ultraviolet lasers
vacuum
chlorine
Oxygen
Hamiltonians
irradiation
oxygen
Laser beam effects
resonance lines
Silicon Dioxide
line shape
computerized simulation

ASJC Scopus subject areas

  • Condensed Matter Physics

これを引用

Characterization of ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica glass. / Nishikawa, Hiroyuki; Nakamura, Ryuta; Ohki, Yoshimichi; Nagasawa, Kaya; Hama, Yoshimasa.

:: Physical Review B, 巻 46, 番号 13, 1992, p. 8073-8079.

研究成果: Article

Nishikawa, Hiroyuki ; Nakamura, Ryuta ; Ohki, Yoshimichi ; Nagasawa, Kaya ; Hama, Yoshimasa. / Characterization of ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica glass. :: Physical Review B. 1992 ; 巻 46, 番号 13. pp. 8073-8079.
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