Characterization of ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica glass

Hiroyuki Nishikawa, Ryuta Nakamura, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama

研究成果: Article

13 引用 (Scopus)

抜粋

An electron-spin-resonance (ESR) study was made on the defect centers induced by vacuum-ultraviolet (vuv) laser (7.9-eV) irradiation in high-purity silica glasses. We observed two types of ESR spectra, each consisting of a concentric pair of four-line peaks, in low-OH oxygen-surplus silica produced with plasma methods. Spin-Hamiltonian parameters determined by computer simulation of the experimental ESR line shapes are consistent with oxy-radicals of chlorine. The observed ClOx (x=2,3) radicals are considered to be due to the reaction between chlorine and oxygen, which were both produced by vuv-laser irradiation.

元の言語English
ページ(範囲)8073-8079
ページ数7
ジャーナルPhysical Review B
46
発行部数13
DOI
出版物ステータスPublished - 1992 1 1
外部発表Yes

ASJC Scopus subject areas

  • Condensed Matter Physics

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