Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions

K.Ueno K.Ueno, V.M.Donnelly V.M.Donnelly, T.Kikkawa T.Kikkawa, Kazuyoshi Ueno

研究成果: Article › 査読

本文言語	English
ページ（範囲）	2565-2572
ジャーナル	Journal of Electrochemical Society
巻	144
出版ステータス	Published - 1997 1月 1

引用スタイル

@article{f6214566ee904a56bdce4577b482bd84,

title = "Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions",

author = "K.Ueno K.Ueno and V.M.Donnelly V.M.Donnelly and T.Kikkawa T.Kikkawa and Kazuyoshi Ueno",

year = "1997",

month = jan,

day = "1",

language = "English",

volume = "144",

pages = "2565--2572",

journal = "Journal of Electrochemical Society",

}