Concurrent reactive ion etching employing micromachined ionic liquid ion source array

Ryo Yoshida, Motoaki Hara, Hiroyuki Oguchi, Tatsuya Suzuki, Hiroki Kuwano

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

This paper describes concurrent reactive ion etching using micro ionic liquid ion source (ILIS) array. The system consists of micro needle emitters and a reservoir for the ionic liquid (IL) of 1-ethyl-3-methylimidazolium tetrafluoroborate ([EMIM]-[BF4]). The ion beam etching of a (100) silicon substrate using the fabricated ILIS array was demonstrated. As a result of mass spectroscopy during the etching, the peaks of SiF+, SiF 2+, and SiF3+ were observed. The chemical reaction between the silicon and fluorine based ions from the IL was confirmed. Also, etching rate of the silicon using the ILIS array applying 5.1 kV ion-acceleration voltage was calculated from the etched dimple on the substrate and was 1.5 times larger than that of a conventional focused Ga + ion beam applying 30 kV ion-acceleration voltage.

本文言語English
ホスト出版物のタイトルMEMS 2014 - 27th IEEE International Conference on Micro Electro Mechanical Systems
出版社Institute of Electrical and Electronics Engineers Inc.
ページ463-466
ページ数4
ISBN(印刷版)9781479935086
DOI
出版ステータスPublished - 2014
外部発表はい
イベント27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014 - San Francisco, CA, United States
継続期間: 2014 1 262014 1 30

出版物シリーズ

名前Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN(印刷版)1084-6999

Conference

Conference27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014
国/地域United States
CitySan Francisco, CA
Period14/1/2614/1/30

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 機械工学
  • 電子工学および電気工学

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