We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67% in the normal incident condition.
|ジャーナル||Materials Science and Engineering B: Solid-State Materials for Advanced Technology|
|出版ステータス||Published - 2008 6 15|
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering