Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors

Uichiro Mizutani, Takashi Yamaguchi, Hiroshi Ikuta, Tetsuya Tomofuji, Yosuke Yanagi, Yoshitaka Itoh, Tetsuo Oka

研究成果: Article査読

2 被引用数 (Scopus)

抄録

We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67% in the normal incident condition.

本文言語English
ページ(範囲)84-89
ページ数6
ジャーナルMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
151
1
DOI
出版ステータスPublished - 2008 6 15
外部発表はい

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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