Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors

Uichiro Mizutani, Takashi Yamaguchi, Hiroshi Ikuta, Tetsuya Tomofuji, Yosuke Yanagi, Yoshitaka Itoh, Tetsuo Oka

研究成果: Article

2 引用 (Scopus)

抄録

We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67% in the normal incident condition.

元の言語English
ページ(範囲)84-89
ページ数6
ジャーナルMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
151
発行部数1
DOI
出版物ステータスPublished - 2008 6 15
外部発表Yes

Fingerprint

Multilayer films
Magnetron sputtering
Magnets
magnetron sputtering
magnets
mirrors
Noble Gases
Fabrication
fabrication
Superconducting magnets
Inert gases
Permanent magnets
Mirrors
Cathodes
Gases
reflectance
Wavelength
Electric potential
superconducting magnets
permanent magnets

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

これを引用

Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors. / Mizutani, Uichiro; Yamaguchi, Takashi; Ikuta, Hiroshi; Tomofuji, Tetsuya; Yanagi, Yosuke; Itoh, Yoshitaka; Oka, Tetsuo.

:: Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 巻 151, 番号 1, 15.06.2008, p. 84-89.

研究成果: Article

Mizutani, Uichiro ; Yamaguchi, Takashi ; Ikuta, Hiroshi ; Tomofuji, Tetsuya ; Yanagi, Yosuke ; Itoh, Yoshitaka ; Oka, Tetsuo. / Construction of superconducting bulk magnet magnetron sputtering apparatus for fabrication of highly reflective optical mirrors. :: Materials Science and Engineering B: Solid-State Materials for Advanced Technology. 2008 ; 巻 151, 番号 1. pp. 84-89.
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abstract = "We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67{\%} in the normal incident condition.",
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AU - Mizutani, Uichiro

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AU - Yanagi, Yosuke

AU - Itoh, Yoshitaka

AU - Oka, Tetsuo

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AB - We have developed the two-cathode magnetron sputtering apparatus equipped with superconducting permanent magnet to produce Mo/Si multi-layer films, which would potentially serve as a high-quality optical mirror at extreme ultraviolet (EUV) wavelength of 13.5 nm. The best deposition condition was searched by analyzing the structure of the inter-diffusion layer formed in the Mo/Si bi-layer film prepared under different deposition conditions. It was found that (1) Xe gas should be used as inert gas species, (2) its pressure is lower than 4 × 10-2 Pa, (3) a throw distance is longer than 250 mm and (4) discharge voltage around 2 kV. By making full use of these data, we synthesized Mo/Si multi-layer films and analyzed the structure and its effect on the reflectivity. The highest EUV-reflectivity so far obtained is 67% in the normal incident condition.

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