Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor

Erika Maeda, Toshihide Nabatame, Masafumi Hirose, Mari Inoue, Akihiko Ohi, Naoki Ikeda, Hajime Kiyono

研究成果: Article › 査読

2 被引用数 (Scopus)

フィンガープリント

「Correlation between SiO<sub>2</sub> growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy