Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

K. Takano, T. Kamiya, M. Sugimoto, S. Seki, T. Satoh, Y. Ishii, T. Ohkubo, M. Koka, H. Nishikawa

研究成果: Article

元の言語English
ジャーナル27th International Conference of Photopolymer Science and Technology (ICPST-27)
出版物ステータスPublished - 2010 6 24

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