Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD

Shiro Shimada, Yusuke Fuji, Hajime Kiyono, Jiro Tsujino, Isao Yamazaki

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Composite TiBC-SiC film coatings with various contents of SiC were deposited on Si wafer at 800°C from a mixed solution of titanium tetra-ethoxide, boron tri-ethoxide and/or hexa-methyl-disiloxane by an Ar/H 2 thermal plasma CVD. The crystalline phases (TiB2, TiC, SiC) in the coatings are identified by thin film grazing incidence X-ray diffraction. The surfaces and cross-sections of the monolithic TiBC and SiC and composite TiBC-SiC coatings are observed by scanning electron microscopy. The microstructure of a cross-section of composite TiBC-55 mol% SiC film is observed by transmission electron microscopy with EDX analysis. The wear rates of the composite TiBC-SiC film are evaluated from cross-sectional profiles of the residual wear tracks formed by ball-on-disk wear tests using SUS and alumina balls with their results correlated with the SiC content and film hardness.

本文言語English
ページ(範囲)415-420
ページ数6
ジャーナルJournal of the Ceramic Society of Japan
117
1364
DOI
出版ステータスPublished - 2009 4

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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