Development and test of model apparatus utilizing HTS magnetic levitation for non-contact spinning clean-up processors of photo mask production

Kimiyo Saito, Satoshi Fukui, Jun Ogawa, Tetsuo Oka, Takao Sato, Satoshi Sorimachi, Shinsuke Miyazaki

研究成果: Article査読

2 被引用数 (Scopus)

抄録

It is considered that particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our R & D, application of magnetic levitation utilizing bulk HTSs to the spin processors for the photo mask production has been proposed. In this study, we try to develop a new model apparatus demonstrating non-contact spinning clean-up processor in photo mask production system. The levitation and rotation test by using this model apparatus showed that this new model apparatus accomplished the remarkable improvement of the levitation and the rotation ability. This paper describes the levitation and rotation test results of the new model spinner comparing with those obtained in our previous study.

本文言語English
論文番号5617305
ページ(範囲)2241-2244
ページ数4
ジャーナルIEEE Transactions on Applied Superconductivity
21
3 PART 2
DOI
出版ステータスPublished - 2011 6
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 電子工学および電気工学

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