It is considered that particle deposition on the photo mask, such as oil dusts which are generated from mechanical bearings of the spin processors, is one of main causes of the deterioration of pattern preciseness. In our R & D, application of magnetic levitation utilizing bulk HTSs to the spin processors for the photo mask production has been proposed. In this study, we try to develop a new model apparatus demonstrating non-contact spinning clean-up processor in photo mask production system. The levitation and rotation test by using this model apparatus showed that this new model apparatus accomplished the remarkable improvement of the levitation and the rotation ability. This paper describes the levitation and rotation test results of the new model spinner comparing with those obtained in our previous study.
|ジャーナル||IEEE Transactions on Applied Superconductivity|
|号||3 PART 2|
|出版ステータス||Published - 2011 6月|
ASJC Scopus subject areas