Development of MEMS pierce-type nanocrystalline Si electron-emitter array for massively parallel electron beam direct writing

Hitoshi Nishino, Shinya Yoshida, Akira Kojima, Naokatsu Ikegami, Nobuyoshi Koshida, Shuji Tanaka, Masayoshi Esashi

研究成果: Conference contribution

7 被引用数 (Scopus)

抄録

This paper mainly reports the process development of a Pierce-type nanocrystalline Si (nc-Si) electron emitter array for massively parallel electron beam (EB) lithography based on active-matrix operation using a large-scaled integrated circuit (LSI). The emitter array consists of 100×100 hemispherical emitters formed by isotropic wet etching of Si. EB resist patterning was demonstrated by 1:1 projection exposure using a discrete emitter array at CMOS-compatible operation voltages. To independently control each emitter using the LSI, isolation trenches filled with benzocyclobutene (BCB) were fabricated in the Si substrate. In addition, the integration process of the emitter array, the LSI and an extraction electrode plate was developed based on Au-In and polymer bonding technologies.

本文言語English
ホスト出版物のタイトルMEMS 2014 - 27th IEEE International Conference on Micro Electro Mechanical Systems
出版社Institute of Electrical and Electronics Engineers Inc.
ページ467-470
ページ数4
ISBN(印刷版)9781479935086
DOI
出版ステータスPublished - 2014
外部発表はい
イベント27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014 - San Francisco, CA, United States
継続期間: 2014 1月 262014 1月 30

出版物シリーズ

名前Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN(印刷版)1084-6999

Conference

Conference27th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2014
国/地域United States
CitySan Francisco, CA
Period14/1/2614/1/30

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 機械工学
  • 電子工学および電気工学

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