@article{0681a6b882494d778a614f29d285afcf,
title = "Development of micromachining technology in ion microbeam system at TIARA, JAEA",
abstract = "An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.",
keywords = "Beam size measurement, Electroplating, Ion microbeam, Ion-beam lithography",
author = "T. Kamiya and H. Nishikawa and T. Satoh and J. Haga and M. Oikawa and Y. Ishii and T. Ohkubo and N. Uchiya and Y. Furuta",
note = "Funding Information: The authors would like to express their appreciation for the great cooperation obtained from all of the accelerator staff in TIARA in carrying out the present experiments. This research was partially supported by the Ministry of Education, Science, Sports and Culture, Grant-in-Aid for Scientific Research (A), 19206105, 2007, and Scientific Research (B), 17310085, 2007, and also partially by funds for 21st Century COE Program (Gunma Univ.).",
year = "2009",
month = mar,
doi = "10.1016/j.apradiso.2008.06.021",
language = "English",
volume = "67",
pages = "488--491",
journal = "Applied Radiation and Isotopes",
issn = "0969-8043",
publisher = "Elsevier Limited",
number = "3",
}