Development of micromachining technology in ion microbeam system at TIARA, JAEA

T. Kamiya, H. Nishikawa, T. Satoh, J. Haga, M. Oikawa, Y. Ishii, T. Ohkubo, N. Uchiya, Y. Furuta

研究成果: Article査読

4 被引用数 (Scopus)

抄録

An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.

本文言語English
ページ(範囲)488-491
ページ数4
ジャーナルApplied Radiation and Isotopes
67
3
DOI
出版ステータスPublished - 2009 3

ASJC Scopus subject areas

  • 放射線

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