Difference between O2 and N2 Annealing Effects on CVD-SiO2 Film Quality Studied by Open-Circuit Measurement

K. Kita, K. Kyuno, A. Toriumi

研究成果: Article

元の言語English
ページ(範囲)786-787
ジャーナルExtended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)
出版物ステータスPublished - 2004 9 1

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