EBSD analysis of electroplated magnetite thin films

A. Koblischka-Veneva, M. R. Koblischka, C. L. Teng, M. P. Ryan, U. Hartmann, F. Mücklich

研究成果: Article査読

2 被引用数 (Scopus)

抄録

By means of electron backscatter diffraction (EBSD), we analyse the crystallographic orientation of electroplated magnetite thin films on Si/copper substrates. Varying the voltage during the electroplating procedure, the resulting surface properties are differing considerably. While a high voltage produces larger but individual grains on the surface, the surfaces become smoother on decreasing voltage. Good quality Kikuchi patterns could be obtained from all samples; even on individual grains, where the surface and the edges could be measured. The spatial resolution of the EBSD measurement could be increased to about 10 nm; thus enabling a detailed analysis of single magnetite grains. The thin film samples are polycrystalline and do not exhibit a preferred orientation. EBSD reveals that the grain size changes depending on the processing conditions, while the detected misorientation angles stay similar.

本文言語English
ページ(範囲)1235-1238
ページ数4
ジャーナルJournal of Magnetism and Magnetic Materials
322
9-12
DOI
出版ステータスPublished - 2010 5 1
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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