Effect of generation and soft lithography on semiconducting dendrimer lasers

Justin R. Lawrence, Ebinazar B. Namdas, Gary J. Richards, Paul L. Burn, Ifor D.W. Samuel

研究成果: Article査読

22 被引用数 (Scopus)

抄録

A study was conducted to investigate the effect of increasing generation on the photophysics and laser performance of a bis-fluorene cored dendrimer. It was found that increasing generation from (G1) to (G2) leads to a rise in the film PLQY from 42-75%. Researchers also fabricated dendrimer distributed feedback (DFB) lasers and an improvement in slope efficiency from 0.3-1.6% was observed as the generation increased. The performance of G2 dendrimer lasers was compared with a laser made by the process of spin-coating the gain material onto a corrugated substrate, using soft lithography. It was observed that the first generation dendrimer (G1) had one level of branching, while the second generation dendrimer (G2) had two levels of branching. The results show the benefits of using a soft lithographic technique, to provide feedback in organic DFB lasers.

本文言語English
ページ(範囲)3000-3003
ページ数4
ジャーナルAdvanced Materials
19
19
DOI
出版ステータスPublished - 2007 10 5
外部発表はい

ASJC Scopus subject areas

  • 材料科学(全般)
  • 材料力学
  • 機械工学

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