Effect of high-temperature treatment on optical-absorption bands in amorphous SiO2

N. Dohguchi, S. Munekuni, H. Nishikawa, Y. Ohki, K. Nagasawa

研究成果: Article › 査読

引用スタイル

@article{fc0f34801d664ba188177ab2a4aa9a59,

title = "Effect of high-temperature treatment on optical-absorption bands in amorphous SiO2",

author = "N. Dohguchi and S. Munekuni and H. Nishikawa and Y. Ohki and K. Nagasawa",

year = "1991",

month = sep,

day = "1",

language = "English",

volume = "70",

pages = "2788--2790",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

}