| 元の言語 | English |
|---|---|
| ページ（範囲） | 3354-3358 |
| ジャーナル | Japanese Journal of Applied Physics |
| 巻 | 46 |
| 出版物ステータス | Published - 2007 6 1 |
これを引用
Effect of Temperature for Photoresist Critical Dimension during Puddle Development. / Eto, H.; Homma, H. Eto;Y.Ito;T.
：: Japanese Journal of Applied Physics, 巻 46, 01.06.2007, p. 3354-3358.研究成果: Article
Eto, H & Homma, HEYIT 2007, 'Effect of Temperature for Photoresist Critical Dimension during Puddle Development', Japanese Journal of Applied Physics, 巻. 46, pp. 3354-3358.
Eto H, Homma HEYIT. Effect of Temperature for Photoresist Critical Dimension during Puddle Development. Japanese Journal of Applied Physics. 2007 6 1;46:3354-3358.
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title = "Effect of Temperature for Photoresist Critical Dimension during Puddle Development",
author = "H. Eto and Homma, {H. Eto;Y.Ito;T.}",
year = "2007",
month = "6",
day = "1",
language = "English",
volume = "46",
pages = "3354--3358",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
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}
TY - JOUR
T1 - Effect of Temperature for Photoresist Critical Dimension during Puddle Development
AU - Eto, H.
AU - Homma, H. Eto;Y.Ito;T.
PY - 2007/6/1
Y1 - 2007/6/1
M3 - Article
VL - 46
SP - 3354
EP - 3358
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
ER -