Effect of Temperature for Photoresist Critical Dimension during Puddle Development

研究成果: Article

1 引用 (Scopus)
元の言語English
ページ(範囲)3354-3358
ジャーナルJapanese Journal of Applied Physics
46
出版物ステータスPublished - 2007 6 1

これを引用

@article{e5077272f7b44acaab430ebdba0edd48,
title = "Effect of Temperature for Photoresist Critical Dimension during Puddle Development",
author = "H. Eto and Homma, {H. Eto;Y.Ito;T.}",
year = "2007",
month = "6",
day = "1",
language = "English",
volume = "46",
pages = "3354--3358",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",

}

TY - JOUR

T1 - Effect of Temperature for Photoresist Critical Dimension during Puddle Development

AU - Eto, H.

AU - Homma, H. Eto;Y.Ito;T.

PY - 2007/6/1

Y1 - 2007/6/1

M3 - Article

VL - 46

SP - 3354

EP - 3358

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

ER -