Effect of Temperature for Photoresist Critical Dimension during Puddle Development

研究成果: Article › 査読

本文言語	English
ページ（範囲）	3354-3358
ジャーナル	Japanese Journal of Applied Physics
巻	46
出版ステータス	Published - 2007 6 1

引用スタイル

@article{e5077272f7b44acaab430ebdba0edd48,

title = "Effect of Temperature for Photoresist Critical Dimension during Puddle Development",

author = "H. Eto and Homma, {H. Eto;Y.Ito;T.}",

year = "2007",

month = jun,

day = "1",

language = "English",

volume = "46",

pages = "3354--3358",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

}

TY - JOUR

T1 - Effect of Temperature for Photoresist Critical Dimension during Puddle Development

AU - Eto, H.

AU - Homma, H. Eto;Y.Ito;T.

PY - 2007/6/1

Y1 - 2007/6/1

M3 - Article

VL - 46

SP - 3354

EP - 3358

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

ER -