Effect of treatment temperature on surface wettability of methylcyclosiloxane layer formed by chemical vapor deposition

Takahiro Ishizaki, Keisuke Sasagawa, Takuya Furukawa, Sou Kumagai, Erina Yamamoto, Satoshi Chiba, Naosumi Kamiyama, Takayoshi Kiguchi

研究成果: Article査読

9 被引用数 (Scopus)

抄録

The surface wettability of the native Si oxide surfaces were tuned by chemical adsorption of 1,3,5,7-tetramethylcyclotetrasiloxane (TMCTS) molecules through thermal CVD method at different temperature. Water contact angle measurements revealed that the water contact angles of the TMCTS-modified Si oxide surfaces at the temperature of 333-373 K were found to be in the range of 92 ± 2-102 ± 2°. The advancing and receding water contact angle of the surface prepared at 333 K were found to be 97 ± 2/92 ± 2°, showing low contact angle hysteresis surface. The water contact angles of the surfaces prepared at the temperature of 373-413 K increased with an increase in the treatment temperature. When the treatment temperature was more than 423 K, the water contact angles of TMCTS-modified surfaces were found to become more than 150°, showing superhydrophobic surface. AFM study revealed that the surface roughness of the TMCTS-modified surface increased with an increase in the treatment temperature. This geometric morphology enhanced the surface hydrophobicity. The surface roughness could be fabricated due to the hydrolysis/condensation reactions in the gas phase during CVD process. The effect of the treatment temperature on the reactivity of the TMCTS molecules were also investigated using a thermogravimetric analyzer.

本文言語English
ページ(範囲)446-451
ページ数6
ジャーナルApplied Surface Science
379
DOI
出版ステータスPublished - 2016 8 30

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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