Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method P2-27,pp.636-639 , June 5-9, 2005, Kitakyushu, Japan

Tomomi Hattori, Emi Irisawa, Hiroyuki Nishikawa

研究成果: Article

元の言語English
ページ(範囲)636-639
ジャーナルProceedings of 2005 International Symposium on Electrical Insulating Materials,
出版物ステータスPublished - 2005 6 8

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