Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method

Engineering & Materials Science

• Plasma CVD 100%
• Photosensitivity 89%
• Bragg gratings 83%
• Absorption spectra 60%
• Silica 56%
• Thin films 52%
• Oxygen 44%
• Irradiation 28%
• Annealing 27%
• Microscopes 26%
• Hot Temperature 26%
• Nitrogen 25%
• Germanium 18%
• Refractive index 18%
• Photons 16%
• Chemical vapor deposition 16%
• Gases 15%
• Electrons 13%
• Impurities 13%
• Masks 13%
• Compaction 11%

Chemical Compounds

• Plasma Chemical Vapour Deposition 74%
• Photosensitivity 69%
• Dioxygen 26%
• Annealing 21%
• Force 18%
• Nitrogen 16%
• Gas 14%
• Liquid Film 13%
• Refractive Index 13%
• Photon 13%
• Ultraviolet Irradiation 12%
• Electron Particle 7%
• Amount 5%