Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Yusuke Tanabe, Hiroyuki Nishikawa, Yoshihiro Seki, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Tohru Watanabe, Atsushi Sekiguchi

研究成果: Article査読

12 被引用数 (Scopus)

抄録

Proton beam writing (PBW) was applied for micromachining of a PMMA mother for Ni electroforming. Proton beam focused down to about 1 μm at beam energy of 1.0-3.0 MeV was used for PBW on a PMMA layer on Si or Cu substrate. Using modified techniques for developing of 15-30-μm thick resists exposed to PB and electroforming steps, fabrication of the Ni structures with aspect ratio up to 30 by electroforming with a 30-μm thick PMMA mother micromachined by PBW was successful. We also tried thermal imprint using a 15-μm thick Ni microstructure on Cu substrate with an aspect ratio of more than 4 on a PMMA film.

本文言語English
ページ(範囲)2145-2148
ページ数4
ジャーナルMicroelectronic Engineering
88
8
DOI
出版ステータスPublished - 2011 8

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学

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