Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi, Masayuki Shimojo, M. Han, K. Furuya

研究成果: Article

117 引用 (Scopus)

抄録

The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

元の言語English
ページ(範囲)2064-2066
ページ数3
ジャーナルApplied Physics Letters
83
発行部数10
DOI
出版物ステータスPublished - 2003 9 8
外部発表Yes

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high energy electrons
electron beams
probes
deposits
transmission electron microscopy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

これを引用

Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons. / Mitsuishi, K.; Shimojo, Masayuki; Han, M.; Furuya, K.

:: Applied Physics Letters, 巻 83, 番号 10, 08.09.2003, p. 2064-2066.

研究成果: Article

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