Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W. Zhang, K. Furuya

研究成果: Article査読

本文言語English
ジャーナルDefault journal
出版ステータスPublished - 2005 12 1

引用スタイル