Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W. Zhang, K. Furuya

研究成果: Article

元の言語English
ジャーナルDefault journal
出版物ステータスPublished - 2005 12 1

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