Electroplating of metal micro-structure using a resist micro-machined by proton beam writing

N. Uchiya, Y. Furuta, H. Nishikawa, T. Watanabe, J. Haga, T. Satoh, M. Oikawa, T. Ohkubo, Y. Ishii, T. Kamiya

研究成果: Conference contribution

抄録

The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.

本文言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
ページ288-289
ページ数2
DOI
出版ステータスPublished - 2007
イベントs20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
継続期間: 2007 11月 52007 11月 8

出版物シリーズ

名前Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Conference

Conferences20th International Microprocesses and Nanotechnology Conference, MNC 2007
国/地域Japan
CityKyoto
Period07/11/507/11/8

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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