Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing

Y. Seki, Y. Furuta, H. Nishikawa, T. Watanabe, T. Nakata, T. Satoh, Y. Ishii, T. Kamiya

研究成果査読

8 被引用数 (Scopus)

抄録

Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.

本文言語English
ページ(範囲)945-948
ページ数4
ジャーナルMicroelectronic Engineering
86
4-6
DOI
出版ステータスPublished - 2009 4 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学

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