Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.
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