TY - JOUR
T1 - Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing
AU - Seki, Y.
AU - Furuta, Y.
AU - Nishikawa, H.
AU - Watanabe, T.
AU - Nakata, T.
AU - Satoh, T.
AU - Ishii, Y.
AU - Kamiya, T.
PY - 2009/4/1
Y1 - 2009/4/1
N2 - Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.
AB - Proton beam writing (PBW) is one of the direct write techniques for the purpose of deep micromachining. Together with the flexibility of the direct write feature, micromachining of high-aspect-ratio structures is possible due to the straight trajectory of the MeV energy protons. However, direct writing is a low throughput process, when compared with a mask process such as UV lithography. For better productivity, coupled use of PBW with electroplating has been proposed as a method to fabricate metal microstructures for molds of imprint lithography. We demonstrate the electroplating of high-aspect-ratio Ni microstructures on PMMA micromachined by PBW.
KW - Electroplating
KW - Microstructures
KW - PMMA
KW - Proton beam writing
UR - http://www.scopus.com/inward/record.url?scp=67349129376&partnerID=8YFLogxK
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U2 - 10.1016/j.mee.2009.01.013
DO - 10.1016/j.mee.2009.01.013
M3 - Article
AN - SCOPUS:67349129376
SN - 0167-9317
VL - 86
SP - 945
EP - 948
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - 4-6
ER -