Evaluation of silica glasses implanted by high-energy ions using a UV-excited microspectroscopy

T. Yamaguchi, E. Watanabe, T. Souno, H. Nishikawa, M. Hattori, Y. Ohki, T. Kamiya, K. Arakawa

研究成果: Article査読

抄録

In this study, defects induced by ion implantation were investigated by a photoluminescence (PL) microspectroscopy. When H+ or He2+ with high energy (∼MeV) were implanted into silica, two PL bands at 290 and 650 nm were observed under 244 nm excitation. The PL bands at 290 and 650 nm were ascribed to oxygen deficient centers and nonbridging oxygen hole centers, respectively. The PL depth profile analysis shows that these PL centers are distributed throughout the tracks of ions, while they are quenched in the proximity of their projected ranges. Based on the observation on the PL profiles, the formation of the PL centers was ascribed to the energy deposition by electronic stopping power. The role of nuclear stopping power on the defect formation is also discussed.

本文言語English
ページ(範囲)371-374
ページ数4
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
191
1-4
DOI
出版ステータスPublished - 2002 5

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

フィンガープリント 「Evaluation of silica glasses implanted by high-energy ions using a UV-excited microspectroscopy」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル