Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy

T. Yamaguchi, E. Watanabe, T. Souno, H. Nishikawa, M. Hattori, Y. Ohki, T. Kamiya, K. Arakawa

研究成果: Article › 査読

本文言語	English
ジャーナル	Abstracts of Radiation Effects in Insulators
出版ステータス	Published - 2001 9月 3

引用スタイル

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title = "Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy",

author = "T. Yamaguchi and E. Watanabe and T. Souno and H. Nishikawa and M. Hattori and Y. Ohki and T. Kamiya and K. Arakawa",

year = "2001",

month = sep,

day = "3",

language = "English",

journal = "Abstracts of Radiation Effects in Insulators",

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TY - JOUR

T1 - Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy

AU - Yamaguchi, T.

AU - Watanabe, E.

AU - Souno, T.

AU - Nishikawa, H.

AU - Hattori, M.

AU - Ohki, Y.

AU - Kamiya, T.

AU - Arakawa, K.

PY - 2001/9/3

Y1 - 2001/9/3

M3 - Article

JO - Abstracts of Radiation Effects in Insulators

JF - Abstracts of Radiation Effects in Insulators

ER -