Fabrication of Bi2SiO5 Thin Films for MFIS Structures

M.Yamaguchi M.Yamaguchi, K.Hiraki K.Hiraki, T.Homma T.Homma, T.Nagatomo T.Nagatomo, Y.Masuda Y.Masuda, Tetsuya Homma

研究成果: Article

元の言語English
ページ(範囲)629-632
ジャーナルProceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF)
II
出版物ステータスPublished - 2001 3 1

これを引用

M.Yamaguchi, M. Y., K.Hiraki, K. H., T.Homma, T. H., T.Nagatomo, T. N., Y.Masuda, Y. M., & Homma, T. (2001). Fabrication of Bi2SiO5 Thin Films for MFIS Structures. Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF), II, 629-632.

Fabrication of Bi2SiO5 Thin Films for MFIS Structures. / M.Yamaguchi, M.Yamaguchi; K.Hiraki, K.Hiraki; T.Homma, T.Homma; T.Nagatomo, T.Nagatomo; Y.Masuda, Y.Masuda; Homma, Tetsuya.

:: Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF), 巻 II, 01.03.2001, p. 629-632.

研究成果: Article

M.Yamaguchi, MY, K.Hiraki, KH, T.Homma, TH, T.Nagatomo, TN, Y.Masuda, YM & Homma, T 2001, 'Fabrication of Bi2SiO5 Thin Films for MFIS Structures', Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF), 巻. II, pp. 629-632.
M.Yamaguchi, M.Yamaguchi ; K.Hiraki, K.Hiraki ; T.Homma, T.Homma ; T.Nagatomo, T.Nagatomo ; Y.Masuda, Y.Masuda ; Homma, Tetsuya. / Fabrication of Bi2SiO5 Thin Films for MFIS Structures. :: Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF). 2001 ; 巻 II. pp. 629-632.
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AU - T.Nagatomo, T.Nagatomo

AU - Y.Masuda, Y.Masuda

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