Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices

Y. Furuta, N. Uchiya, H. Nishikawa, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

Figures 1 (a), (b) and (c) show SEM images of 21 μm thick SU-8 pillars on silicon developed after PBW. These data demonstrate a capability of PBW to fabricate vertical pillars with a height of 21.0 μm and a width of as small as 1.1 μm with a high aspect ratio of 20, with a uniformity over 700 μm squared area. An optical microscope image in Figure 2 shows a part of a DEP device, where the high-aspect-ratio SU-8 pillars with a 12 μm pitch were formed in the gap between the two surface electrodes. Our preliminary investigation shows that Escherichia coli can be trapped at pillar structures under AC bias (3 volts, 100 kHz) of the two electrodes. The trapping behavior of DEP device with different structures and sizes will be examined.

本文言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
ページ340-341
ページ数2
DOI
出版ステータスPublished - 2007 12 1
イベントs20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
継続期間: 2007 11 52007 11 8

出版物シリーズ

名前Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Conference

Conferences20th International Microprocesses and Nanotechnology Conference, MNC 2007
国/地域Japan
CityKyoto
Period07/11/507/11/8

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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