TY - GEN
T1 - Fabrication of high-aspect-ratio pillars by proton beam writing and application to DEP-devices
AU - Furuta, Y.
AU - Uchiya, N.
AU - Nishikawa, H.
AU - Haga, J.
AU - Oikawa, M.
AU - Satoh, T.
AU - Ishii, Y.
AU - Kamiya, T.
AU - Nakao, R.
AU - Uchida, S.
PY - 2007
Y1 - 2007
N2 - Figures 1 (a), (b) and (c) show SEM images of 21 μm thick SU-8 pillars on silicon developed after PBW. These data demonstrate a capability of PBW to fabricate vertical pillars with a height of 21.0 μm and a width of as small as 1.1 μm with a high aspect ratio of 20, with a uniformity over 700 μm squared area. An optical microscope image in Figure 2 shows a part of a DEP device, where the high-aspect-ratio SU-8 pillars with a 12 μm pitch were formed in the gap between the two surface electrodes. Our preliminary investigation shows that Escherichia coli can be trapped at pillar structures under AC bias (3 volts, 100 kHz) of the two electrodes. The trapping behavior of DEP device with different structures and sizes will be examined.
AB - Figures 1 (a), (b) and (c) show SEM images of 21 μm thick SU-8 pillars on silicon developed after PBW. These data demonstrate a capability of PBW to fabricate vertical pillars with a height of 21.0 μm and a width of as small as 1.1 μm with a high aspect ratio of 20, with a uniformity over 700 μm squared area. An optical microscope image in Figure 2 shows a part of a DEP device, where the high-aspect-ratio SU-8 pillars with a 12 μm pitch were formed in the gap between the two surface electrodes. Our preliminary investigation shows that Escherichia coli can be trapped at pillar structures under AC bias (3 volts, 100 kHz) of the two electrodes. The trapping behavior of DEP device with different structures and sizes will be examined.
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U2 - 10.1109/IMNC.2007.4456243
DO - 10.1109/IMNC.2007.4456243
M3 - Conference contribution
AN - SCOPUS:47349099344
SN - 4990247248
SN - 9784990247249
T3 - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
SP - 340
EP - 341
BT - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
T2 - s20th International Microprocesses and Nanotechnology Conference, MNC 2007
Y2 - 5 November 2007 through 8 November 2007
ER -