Fabrication of Mo/Si multilayer mirrors for extreme ultraviolet lithography by means of superconducting bulk magnet magnetron sputtering
U. Mizutani, T. Yamaguchi, H. Ikuta, T. Tomofuji, Y. Yanagi, Y. Itoh, T. Oka
研究成果: Article › 査読
7
被引用数
(Scopus)