Fabrication of Mo/Si multilayer mirrors for extreme ultraviolet lithography by means of superconducting bulk magnet magnetron sputtering

Engineering & Materials Science

• Atoms 17%
• Cathodes 16%
• Electron microscopes 15%
• Extreme ultraviolet lithography 100%
• Fabrication 50%
• Gases 19%
• Magnetron sputtering 90%
• Magnets 69%
• Multilayer films 77%
• Multilayers 65%
• Networks (circuits) 9%
• Semiconductor materials 14%
• Surface roughness 28%
• Wavelength 14%

Chemical Compounds

• Electron Particle 12%
• Gas 23%
• Interdiffusion 35%
• Liquid Film 21%
• Magnetron Sputtering 78%
• Multilayer 60%
• Multilayer Film 79%
• Reflectivity 51%
• Semiconductor 17%
• Surface Roughness 45%
• Wavelength 16%

Physics & Astronomy

• atmospheres 7%
• atoms 5%
• cathodes 9%
• electron microscopes 8%
• fabrication 40%
• gases 5%
• lithography 56%
• magnetron sputtering 56%
• magnets 55%
• mirrors 48%
• reflectance 31%
• residual gas 13%
• surface roughness 19%
• wafers 16%
• wavelengths 5%