TY - JOUR
T1 - Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA
AU - Kamiya, T.
AU - Takano, K.
AU - Ishii, Y.
AU - Satoh, T.
AU - Oikawa, M.
AU - Ohkubo, T.
AU - Haga, J.
AU - Nishikawa, H.
AU - Furuta, Y.
AU - Uchiya, N.
AU - Seki, S.
AU - Sugimoto, M.
N1 - Funding Information:
The authors would like to express their appreciation for the great cooperation obtained from all of the accelerator staff in TIARA in carrying out the present experiments. This research was partially supported by the Ministry of Education, Science, Sports and Culture, Grant-in-Aid for Scientific Research (A), 19206105, 2007 and Scientific Research (B), 17310085, 2007.
PY - 2009/6/15
Y1 - 2009/6/15
N2 - In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, we have produced three-dimensional micro/nano-structures with high aspect ratio using cross linking process based on negative resist such as SU-8 by a technique of mask less ion beam lithography. By bombarding high energy heavy ions such as 450 MeV Xe23+ to SU-8, on the other hand, it appeared that a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment for this purpose using a combination of 15 MeV Ni4+ ion microbeam patterning and the 450 MeV 129Xe23+ hitting on SU-8.
AB - In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, we have produced three-dimensional micro/nano-structures with high aspect ratio using cross linking process based on negative resist such as SU-8 by a technique of mask less ion beam lithography. By bombarding high energy heavy ions such as 450 MeV Xe23+ to SU-8, on the other hand, it appeared that a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment for this purpose using a combination of 15 MeV Ni4+ ion microbeam patterning and the 450 MeV 129Xe23+ hitting on SU-8.
KW - High aspect ratio
KW - Ion microbeam systems
KW - Lithography
KW - Nanowires
KW - Three-dimensional structure
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U2 - 10.1016/j.nimb.2009.03.043
DO - 10.1016/j.nimb.2009.03.043
M3 - Article
AN - SCOPUS:66349100684
SN - 0168-583X
VL - 267
SP - 2317
EP - 2320
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 12-13
ER -