Fabrication of patterned domains with graphitic clusters in amorphous carbon using a combination of ion implantation and electron irradiation techniques

Eiji Iwamura, Tatsuhiko Aizawa

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

Fabrication of domains containing graphitic structures in amorphous carbon (a-C) films was demonstrated. Amorphous carbon thin films with 200 nm thickness were deposited on Si substrates by ion-beam sputtering. Iron atoms in a range from 4×1013 to 3.7×1016 cm-2 were doped to the a-C films by an ion implantation technique through a nickel mask with a grid of square windows of 500×500 μm and a net of 50 μm in width as a template. After removing the metal mask, the partly Fe-containing a-C films were exposed to a low-energy electron shower. In the regions where Fe atoms were implanted, Fe were crystallized and preferably diffused toward the film surface leaving graphitic structures more than 10 nm in size in the interior of the amorphous carbon films. On the other hand, the masked regions, where Fe atoms were not implanted, remained amorphous. The results suggest that regions, which consist of amorphous domains and graphitic domains, can be intentionally arranged in a-C thin films.

本文言語English
ホスト出版物のタイトルGrowth, Modification and Analysis by Ion Beams at the Nanoscale
出版社Materials Research Society
ページ108-113
ページ数6
ISBN(印刷版)1558998632, 9781558998636
DOI
出版ステータスPublished - 2005
外部発表はい
イベント2005 MRS Fall Meeting - Boston, MA, United States
継続期間: 2005 11 282005 12 2

出版物シリーズ

名前Materials Research Society Symposium Proceedings
908
ISSN(印刷版)0272-9172

Conference

Conference2005 MRS Fall Meeting
国/地域United States
CityBoston, MA
Period05/11/2805/12/2

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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