Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam

Kenta Miura, Yuki Machida, Masato Uehara, Hiromu Kiryu, Yusuke Ozawa, Tomoyuki Sasaki, Osamu Hanaizumi, Takahiro Satoh, Yasuyuki Ishii, Masashi Kohka, Katsuyoshi Takano, Takeru Ohkubo, Akiyoshi Yamazaki, Wataru Kada, Akihito Yokoyama, Tomihiro Kamiya, Hiroyuki Nishikawa

研究成果

9 被引用数 (Scopus)

抄録

Proton beam writing (PBW) has attracted much attention recently as a next-generation micro-fabrication technology. It is a direct-drawing technique and does not need any masks to transfer micro-patterns to sample surfaces. In addition, the refractive index of a poly(methyl methacrylate) (PMMA) can be increased by proton-beam irradiation. In this study, we fabricated the first 1.5-μm-band single-mode, straight-line waveguides and Y-junction waveguides consisting of PMMA layers using the PBW technique.

本文言語English
ホスト出版物のタイトルSilicon Science and Advanced Micro-Device Engineering II
出版社Trans Tech Publications Ltd
ページ147-150
ページ数4
ISBN(印刷版)9783037852859
DOI
出版ステータスPublished - 2012
イベント6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, ISSS and AMDE 2010 - Kiryu, Japan
継続期間: 2010 12 92010 12 10

出版物シリーズ

名前Key Engineering Materials
497
ISSN(印刷版)1013-9826
ISSN(電子版)1662-9795

Conference

Conference6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, ISSS and AMDE 2010
国/地域Japan
CityKiryu
Period10/12/910/12/10

ASJC Scopus subject areas

  • 材料科学(全般)
  • 材料力学
  • 機械工学

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