Fabrication of three-dimensional structures of resist by proton beam writing

Yusuke Furuta, Naoyuki Uchiya, Hiroyuki Nishikawa, Junji Haga, Takahiro Sato, Masakazu Oikawa, Yasuyuki Ishii, Tomihiro Kamiya

研究成果: Article

19 引用 (Scopus)

抄録

The fabrication of three-dimensional (3D) structures was demonstrated by proton beam writing (PBW) using a MeV light-ion microbeam system at Japan Atomic Energy Agency. The fabrication of the 3D structures was performed using PBW in a thick SU-8 layer with a thickness of up to 50 μm, which is a typical negative resist. The authors exposed the negative resist on a silicon substrate to focused MeV proton beams within 1 μm in diameter, using two different beam energies to obtain two different depths in the resist aiming at fabrication of 3D structures. The two different beam energies were obtained using a 75 μm Kapton film as a beam energy degrader to generate 1.6 MeV proton beam from 3.0 MeV, or using the accelerator voltage control in order to produce beam energy of 1.2 MeV. The 3D lines and space structures with the same shape were fabricated using the two different methods. An Arc de Triomphe shape was also manufactured to demonstrate the superior and unique features of the PBW as a versatile tool for deep micromachining for 3D structures with high aspect ratio.

元の言語English
ページ(範囲)2171-2174
ページ数4
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
25
発行部数6
DOI
出版物ステータスPublished - 2007

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Proton beams
proton beams
Fabrication
fabrication
Kapton (trademark)
microbeams
energy
light ions
Micromachining
micromachining
nuclear energy
high aspect ratio
Nuclear energy
Voltage control
Particle accelerators
Aspect ratio
Japan
accelerators
arcs
Silicon

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

これを引用

Fabrication of three-dimensional structures of resist by proton beam writing. / Furuta, Yusuke; Uchiya, Naoyuki; Nishikawa, Hiroyuki; Haga, Junji; Sato, Takahiro; Oikawa, Masakazu; Ishii, Yasuyuki; Kamiya, Tomihiro.

:: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 巻 25, 番号 6, 2007, p. 2171-2174.

研究成果: Article

Furuta, Yusuke ; Uchiya, Naoyuki ; Nishikawa, Hiroyuki ; Haga, Junji ; Sato, Takahiro ; Oikawa, Masakazu ; Ishii, Yasuyuki ; Kamiya, Tomihiro. / Fabrication of three-dimensional structures of resist by proton beam writing. :: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2007 ; 巻 25, 番号 6. pp. 2171-2174.
@article{26c9b6c3e7484edaaf3a10b2deb00c7d,
title = "Fabrication of three-dimensional structures of resist by proton beam writing",
abstract = "The fabrication of three-dimensional (3D) structures was demonstrated by proton beam writing (PBW) using a MeV light-ion microbeam system at Japan Atomic Energy Agency. The fabrication of the 3D structures was performed using PBW in a thick SU-8 layer with a thickness of up to 50 μm, which is a typical negative resist. The authors exposed the negative resist on a silicon substrate to focused MeV proton beams within 1 μm in diameter, using two different beam energies to obtain two different depths in the resist aiming at fabrication of 3D structures. The two different beam energies were obtained using a 75 μm Kapton film as a beam energy degrader to generate 1.6 MeV proton beam from 3.0 MeV, or using the accelerator voltage control in order to produce beam energy of 1.2 MeV. The 3D lines and space structures with the same shape were fabricated using the two different methods. An Arc de Triomphe shape was also manufactured to demonstrate the superior and unique features of the PBW as a versatile tool for deep micromachining for 3D structures with high aspect ratio.",
author = "Yusuke Furuta and Naoyuki Uchiya and Hiroyuki Nishikawa and Junji Haga and Takahiro Sato and Masakazu Oikawa and Yasuyuki Ishii and Tomihiro Kamiya",
year = "2007",
doi = "10.1116/1.2806974",
language = "English",
volume = "25",
pages = "2171--2174",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "6",

}

TY - JOUR

T1 - Fabrication of three-dimensional structures of resist by proton beam writing

AU - Furuta, Yusuke

AU - Uchiya, Naoyuki

AU - Nishikawa, Hiroyuki

AU - Haga, Junji

AU - Sato, Takahiro

AU - Oikawa, Masakazu

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

PY - 2007

Y1 - 2007

N2 - The fabrication of three-dimensional (3D) structures was demonstrated by proton beam writing (PBW) using a MeV light-ion microbeam system at Japan Atomic Energy Agency. The fabrication of the 3D structures was performed using PBW in a thick SU-8 layer with a thickness of up to 50 μm, which is a typical negative resist. The authors exposed the negative resist on a silicon substrate to focused MeV proton beams within 1 μm in diameter, using two different beam energies to obtain two different depths in the resist aiming at fabrication of 3D structures. The two different beam energies were obtained using a 75 μm Kapton film as a beam energy degrader to generate 1.6 MeV proton beam from 3.0 MeV, or using the accelerator voltage control in order to produce beam energy of 1.2 MeV. The 3D lines and space structures with the same shape were fabricated using the two different methods. An Arc de Triomphe shape was also manufactured to demonstrate the superior and unique features of the PBW as a versatile tool for deep micromachining for 3D structures with high aspect ratio.

AB - The fabrication of three-dimensional (3D) structures was demonstrated by proton beam writing (PBW) using a MeV light-ion microbeam system at Japan Atomic Energy Agency. The fabrication of the 3D structures was performed using PBW in a thick SU-8 layer with a thickness of up to 50 μm, which is a typical negative resist. The authors exposed the negative resist on a silicon substrate to focused MeV proton beams within 1 μm in diameter, using two different beam energies to obtain two different depths in the resist aiming at fabrication of 3D structures. The two different beam energies were obtained using a 75 μm Kapton film as a beam energy degrader to generate 1.6 MeV proton beam from 3.0 MeV, or using the accelerator voltage control in order to produce beam energy of 1.2 MeV. The 3D lines and space structures with the same shape were fabricated using the two different methods. An Arc de Triomphe shape was also manufactured to demonstrate the superior and unique features of the PBW as a versatile tool for deep micromachining for 3D structures with high aspect ratio.

UR - http://www.scopus.com/inward/record.url?scp=37149049907&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=37149049907&partnerID=8YFLogxK

U2 - 10.1116/1.2806974

DO - 10.1116/1.2806974

M3 - Article

AN - SCOPUS:37149049907

VL - 25

SP - 2171

EP - 2174

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 6

ER -