Far Infrared Study of Structural Distortion and Transformation of HfO2 by Introducing a Slight Amount Si

K. Tomida, K. Kita, K. Kyuno, A. Toriumi

研究成果 › 査読

本文言語	English
ページ（範囲）	790-791
ジャーナル	Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)
出版ステータス	Published - 2004 9月 1

引用スタイル

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title = "Far Infrared Study of Structural Distortion and Transformation of HfO2 by Introducing a Slight Amount Si",

author = "K. Tomida and K. Kita and K. Kyuno and A. Toriumi",

year = "2004",

month = sep,

day = "1",

language = "English",

pages = "790--791",

journal = "Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)",

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T1 - Far Infrared Study of Structural Distortion and Transformation of HfO2 by Introducing a Slight Amount Si

AU - Tomida, K.

AU - Kita, K.

AU - Kyuno, K.

AU - Toriumi, A.

PY - 2004/9/1

Y1 - 2004/9/1

M3 - Article

SP - 790

EP - 791

JO - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

JF - Extended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)

ER -