Femtosecond laser-assisted etching of fluoride crystals

Shigeki Matsuo, Kodai Iwasa, Takuro Tomita, Shuichi Hashimoto, Tatsuya Okada

研究成果: Article

抜粋

Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.

元の言語English
ページ(範囲)245-248
ページ数4
ジャーナルJournal of Laser Micro Nanoengineering
6
発行部数3
DOI
出版物ステータスPublished - 2011 12

ASJC Scopus subject areas

  • Instrumentation
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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