Femtosecond laser-assisted etching of fluoride crystals

Shigeki Matsuo, Kodai Iwasa, Takuro Tomita, Shuichi Hashimoto, Tatsuya Okada

研究成果: Article査読

1 被引用数 (Scopus)

抄録

Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.

本文言語English
ページ(範囲)245-248
ページ数4
ジャーナルJournal of Laser Micro Nanoengineering
6
3
DOI
出版ステータスPublished - 2011 12
外部発表はい

ASJC Scopus subject areas

  • 器械工学
  • 産業および生産工学
  • 電子工学および電気工学

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