Femtosecond two-photon stereo-lithography

M. Miwa, S. Juodkazis, T. Kawakami, Shigeki Matsuo, H. Misawa

研究成果: Article

103 引用 (Scopus)

抄録

We report herein a method for the three-dimensional (3D) fabrication of microstructures by means of direct fs-beam writing (scanning) inside a polymerizable resin. Photopolymerization takes place via two-photon absorption (TPA), as indicated by measurements of transmission power dependence. This concept of fabrication is based on two principles: the use of short, sub-picosecond pulses and simultaneous tight focusing (numerical aperture, NA > 1). This approach creates a unique opportunity for avoiding self-focusing even at very high intensities, as the power is lower than the self-focusing threshold. Under such conditions, no filament formation takes place and no thermal convection disturbance occurs in the focal vicinity during photo-polymerization. This technique requires no sacrificial layers or structures in real 3D micro-stereo-lithography.

元の言語English
ページ(範囲)561-566
ページ数6
ジャーナルApplied Physics A: Materials Science and Processing
73
発行部数5
DOI
出版物ステータスPublished - 2001 11
外部発表Yes

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Photopolymerization
self focusing
Lithography
lithography
Photons
Fabrication
fabrication
power transmission
picosecond pulses
photons
numerical aperture
Power transmission
free convection
resins
filaments
disturbances
polymerization
Resins
Scanning
microstructure

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

これを引用

Femtosecond two-photon stereo-lithography. / Miwa, M.; Juodkazis, S.; Kawakami, T.; Matsuo, Shigeki; Misawa, H.

:: Applied Physics A: Materials Science and Processing, 巻 73, 番号 5, 11.2001, p. 561-566.

研究成果: Article

Miwa, M. ; Juodkazis, S. ; Kawakami, T. ; Matsuo, Shigeki ; Misawa, H. / Femtosecond two-photon stereo-lithography. :: Applied Physics A: Materials Science and Processing. 2001 ; 巻 73, 番号 5. pp. 561-566.
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